Charged particle beam device probe operation

ABSTRACT

An apparatus including a positioner control device, a measuring device and a control routine. The positioner control device is communicatively coupled to a chamber of a charged particle beam device (CPBD) and is configured to individually manipulate each of a plurality of probes within the CPBD chamber to establish contact between ones of the plurality of probes and corresponding ones of a plurality of contact points of a sample positioned in the CPBD chamber. The measuring device is communicatively coupled to the CPBD and the positioner control device and is configured to perform one of a measurement and a detection of a characteristic associated with one of the plurality of contact points. The control routine is configured to at least partially automate control of at least one of the CPBD, the positioner control device and the measuring device.

This application claims the benefit of U.S. Provisional Application No.60/546,840, entitled “AUTOMATED AND SEMI-AUTOMATED PROBING IN A CHARGEDPARTICLE BEAM DEVICE,” filed Feb. 23, 2004, the disclosure of which ishereby incorporated herein by reference.

This application is also related to commonly-assigned U.S. applicationSer. No. 10/XXX,XXX, entitled “PROBE CURRENT IMAGING,” filedconcurrently herewith, the disclosure of which is hereby incorporatedherein by reference.

This application is also related to commonly-assigned U.S. applicationSer. No. 10/XXX,XXX, entitled “PROBE TIP PROCESSING,” filed concurrentlyherewith, the disclosure of which is hereby incorporated herein byreference.

BACKGROUND

A charged particle beam device (CPBD) is often required to examine andperform manipulation of micro- and nano-scale objects. In general, aCPBD employs a charged particle beam (CPB) to irradiate a sample understudy, or a focused spot on the study, wherein the wavelength of the CPBis much smaller than the wavelength of light used in opticalmicroscopes. Modern CPBD can view details at the atomic level withsub-nanometer resolution (e.g., down to about 0.1 nm resolution) at amagnification of up to about one million. CPB microscopes and otherswhich may be similarly employed include scanning electron microscopes(SEM), focused ion beam (FIB) microscopes and transmission electronmicroscopes (TEM), among others.

A scanning electron microscope (SEM) is another type of CPB microscope.In an exemplary SEM, a beam of electrons may be focused to a point(e.g., “spot” mode) and scanned over the surface of the specimen.Detectors collect the backscattered and secondary electrons reflected orotherwise originating from the surface of the specimen and convert theminto a signal that is used to produce a realistic, multi-dimensionalimage of the specimen. SEMs can provide a magnification of up to abouttwo hundred thousand, possibly higher.

For some applications, a probe or plurality of probes may be used insidea CPBD to acquire additional data, properties and/or characteristics ofsamples. Such probes may also be used to performed tests on or withsamples within the CPBD to collect such data, properties and/orcharacteristics of samples, among other purposes.

However, it can be difficult to accurately position and/or orient aprobe or sample within an SEM or other CPBD. In fact, it can bedifficult to even distinguish between the plurality of probes that maybe employed within the CPBD to manipulate the sample. It can also bedifficult to verify adequate physical and/or electrical contact betweena probe and a contact point on a sample.

BRIEF DESCRIPTION OF THE DRAWINGS

The present disclosure is best understood from the following detaileddescription when read with the accompanying figures. It is emphasizedthat, in accordance with the standard practice in the industry, variousfeatures are not drawn to scale. In fact, the dimensions of the variousfeatures may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 is a schematic diagram of at least a portion of one embodiment ofapparatus according to aspects of the present disclosure.

FIG. 2 is a block diagram of at least a portion of one embodiment ofapparatus according to aspects of the present disclosure.

FIG. 3A is a flow-chart diagram of at least a portion of one embodimentof a method according to aspects of the present disclosure.

FIG. 3B is a flow-chart diagram of at least a portion of anotherembodiment of the method shown in FIG. 3A.

FIG. 4 is a perspective view of at least a portion of one embodiment ofapparatus according to aspects of the present disclosure.

FIG. 5 is a perspective view of at least a portion of one embodiment ofapparatus according to aspects of the present disclosure.

FIG. 6 is a flow-chart diagram of at least a portion of one embodimentof a method according to aspects of the present disclosure.

FIG. 7 is a block-diagram of at least a portion of one embodiment ofapparatus according to aspects of the present disclosure.

FIG. 8 is a block-diagram of at least a portion of one embodiment ofapparatus according to aspects of the present disclosure.

FIG. 9 is a flow-chart diagram of at least a portion of one embodimentof a method according to aspects of the present disclosure.

FIG. 10 is a flow-chart diagram of at least a portion of one embodimentof a method according to aspects of the present disclosure.

FIG. 11 is a flow-chart diagram of at least a portion of one embodimentof a method according to aspects of the present disclosure.

FIGS. 12A-12C are schematic views of various stages of at least aportion of one embodiment of a method according to aspects of thepresent disclosure.

FIGS. 13A-13C are representations of shifting in images generated by acharged particle beam device according to aspects of the presentdisclosure.

FIG. 14 is a perspective view of at least a portion of one embodiment ofapparatus according to aspects of the present disclosure.

DETAILED DESCRIPTION

Disclosed herein are exemplary embodiments of manual, partiallyautomated and substantially automated apparatus and methods for probingone or more samples in a charged particle beam device (CPBD). Forexample, such probing may comprise or support automated measurement ordetection of one or more characteristics of the sample(s). Suchcharacteristics may include mechanical, electrical, optical and/orchemical characteristics, and/or combinations thereof, withoutlimitation. Exemplary samples within the scope of the present disclosureinclude, without limitation, an integrated circuit (IC), a partiallyfinished IC, a de-processed IC, a transistor, other electronic andmicro-electronic devices, micro-electromechanical systems (MEMS)devices, electro-optical devices and circuits, and combinations thereof,among others. Other samples may include nano-particles, nano-materials,coatings, biological samples, and combinations thereof. A CPBD withinthe scope of the present disclosure may be or include a charged particlebeam microscope (CPBM), among others. For example, a CPBM may be orinclude a focused ion beam (FIB) microscope, a dual-beam FIB microscope,a scanning electron microscope (SEM), a scanning auger microscope (SAM),a transmission electron microscope (TEM), and an environmental scanningelectron microscope (ESEM), among others. Of course, the scope of thepresent disclosure is not limited to the characteristics, samples orCPBDs described above.

Embodiment of methods according to aspects of the present disclosure mayinclude, at least in part, one or more steps or processes for performingthe following operations: (1) preparing a sample for introduction into aCPBD; (2) introducing the sample into the CPBD; (3) preparing the samplefor measurement using one or more probes; (4) preparing the probes formeasurement of one or more characteristics of the sample; (5) locatingthe probes proximate corresponding target areas on the sample; (6)establishing contact between the probes and the target areas; (7)measuring the characteristic(s); (8) removal of probes and samples fromthe CPBD; and (9) processing data collected during one or more of theprevious processes. Embodiment of methods according to aspects of thepresent disclosure may also or alternatively include transmitting datacollected during one or more of such processes. Such data transmissionmay be by TCP/IP or other protocols, possibly depending on thetransmission destination, wherein possible destinations may includecomponents that are ancillary to, associated with, or merely configuredto communicate with the CPBD, including components that are centrally orremotely located relative to the CPBD. One, several or each of suchoperations, or one or more of the steps or processes executed therefor,may be partially or substantially automated.

Aspects of such automation may be provided by the automation of variousdevices employed to orient and otherwise operate one or more probes andone or more samples, as well as those devices employed to measure thecharacteristic(s), all of which may be communicatively coupled as anAutomated Probing System (APS). Thus, communications may be sent betweenthese devices to control initiation, adjustment or termination of theabove-described operations, or for one or more of the steps or processesexecuted during such operations. Such communications may also be sentautomatically between these devices, such as at the control of the APSand/or otherwise in the absence of user input.

In one embodiment, the APS relies on or otherwise employs a ReferenceSystem (RS) by which the orientation of the moving components of thevarious devices comprising the APS can be referenced to each other andto fixed components or devices. The RS may thus support or providemonitoring of the spatial relationships within the APS, includingspatial relationships between and among moving and fixed components ordevices. For example, in one embodiment, the spatial relationships ofmoving components of the various devices is employed to automaticallyposition probe tips relative to each other and/or to features of asample being probed. Moreover, because the various devices of the APScan be communicatively coupled, information gathered by the RS can becommunicated among the devices to initiate, monitor, adjust and/orterminate one or more processes performed by a component or device inthe APS, as well as to collect data related to one or more suchprocesses.

The RS and/or other components of the APS, as well as the APS itself,may employ or rely on aspects of U.S. patent application Ser. No.10/698,178, “SYSTEM AND METHOD OF PROCESSING DAG OCTREE,” filed Oct. 31,2003, and/or U.S. patent application Ser. No. 10/749,256, “ISO-SURFACEEXTRACTION INTO SPLAT HIERARCHY,” filed Dec. 31, 2003, each of which arehereby incorporated by reference in their entirety herein. Theseapplications relate to computer simulation and imaging aspects which maybe employed to generate and display static and real-time images ofprobes, samples and CPBD chambers within the scope of the presentdisclosure. For example, such computer simulated imaging may be employedin support of collision avoidance procedures during the transport ofsamples and probes within a CPBD chamber according to aspects of thepresent disclosure. However, such collision avoidance may additionallyor alternatively be implemented in a more physical form, such as byproximity and/or contact detection, including in a partially orsubstantially automated manner.

The RS can comprise a variety of devices such as, without limitation,location sensors, pressure sensors, environmental sensors,material/element sensors, and/or timers, among others. The RS may alsoinclude one or more devices operable to execute location procedures,such as locating by imaging. The devices and/or components of the RS maybe operable to gather information regarding the various devices and/orcomponents of the APS and/or the steps, processes, actions or operationsperformed thereby. The RS may also include programming and/or softwarefor converting the gathered information, such as into messages that maybe communicated among the devices. For example, the messages from the RSmay be in the form of an electronic signal, or may be in the form of acommand generated by software associated with the RS.

The RS may be implemented as a part of a Control Routine (CR) that maybe programmed into one of the communicatively coupled devices of theAPS. In one such embodiment, the RS is implemented in the CR as a set ofprocedures that are programmed into a position control device thatprovides operability to the probes. The CR may also comprise varioussub-routines for enabling automated probing and other automatedprocesses according to aspects of the present disclosure.

Various aspects of the RS may vary depending on the type of process orprocesses to be performed by the RS, possibly including automatedprocesses. For example, the information required by the RS during theautomated preparation of a probe can vary from the information requiredby the RS during the automated measurement of a characteristic of asample. In some embodiments, however, possibly regardless of the type ofautomated process or processes being performed, the RS relies on certaincommon factors, such as the position of a sample relative to a chargedparticle beam (CPB) produced by a CPBD, the position of probe tipsrelative to the sample, and a map of the sample.

A map of the sample refers to data regarding the sample that can beused, for example, to determine the location of features on the sample.For example, the sample may be a semiconductor chip with certainfeatures formed thereon. A map of the chip may provide locationinformation regarding one or more of those features. A map of a samplecan be obtained from a variety of sources including, for example,computer-aided design (CAD) data, manual training of the sample by auser, and/or a set of reference coordinates specified by a user and/oran external system.

In embodiments in which the RS relies on the position of a samplerelative to a CPB, the RS may use information obtained from a processimplemented by the CR for determining the position of the samplepositioned in a sample chamber of the CPBD relative to the CPB.Alternatively, or additionally, the CR may include one or more processesemployable to determine the location of the sample relative to apositioning stage or probe tip, as well as one or more processesemployable to determine the location of the stage or probe tip relativeto the CPB. Alternatively, or additionally, the CR may include one ormore processes employable to determine the location of the probe tiprelative to the positioning stage, as well as one or more processesemployable to determine the location of the stage relative to the CPB.

In one embodiment, the CR implements a standard image-analysis procedureto determine the position of the sample relative to the CPB, thepositioning stage and/or the probe tip. For example, the image can bederived from a representation created from the CPBD or other such devicethat can create a suitable representation for use by image-analysissoftware. Reference features on the sample, stage and/or probe tip canbe used in the image-analysis to create a mathematical coordinate systemto describe the location of the sample, stage and/or probe tip to theRS.

In embodiments in which the RS relies on the position of the probe tipsrelative to the sample, the RS may use information obtained from aprocess implemented by the CR for determining the location of the probetips relative to the position of the sample in the sample chamber. Forexample, the location of the probe tips relative to the CPB and/or stagemay be determined using suitable image-analysis techniques.Alternatively, or additionally, the location of the probe tips relativeto the probe positioner may be determined, and then the location of theprobe tips relative to the CPB or stage may be determined. The locationof the probe tips can be determined by image-analysis, or by moving theprobe tips to a mechanical, electrical or laser sensor that providessuitable feedback for such a requirement, among other possible methods.

In embodiments in which the RS relies on a map, the RS may communicateinformation to a device providing operability of the probes, such as apositioner control device, which may trigger such device to drive theposition of the probe tips over specified features. For example, thecoordinates of features relative to the map and the actual location ofthe sample under inspection, or the actual location of the probe tips,and/or the actual location of the positioners can be mathematicallycombined.

Referring to FIG. 1, illustrated is at least a portion of one embodimentof an apparatus 100 according to aspects of the present disclosure. Theapparatus 100 may include or be substantially similar to an APSaccording to one or more of the aspects described above.

The apparatus 100 includes a positioner control device 102, a CPBD 104and a measuring device 106. The positioner control device 102 may beconfigured to control a manipulation platform to which one or moreprobes are coupled. For example, the positioner control device 102 maybe or include the S100 Nanomanipulator System commercially availablefrom Zyvex Corporation, among other manipulators. The CPBD 104 may be orinclude an SEM or FIB available from FEI, Hitachi or JEOL, among others.The measuring device 106 may be or include the Keithley 4200, which isalso commercially available, among other measuring devices.

The positioner control device 102, the CPBD 104 and the measuring device106 are coupled such that communications are sent between the devices toinitiate, adjust, monitor, collect data relative to, and/or terminateprocesses. Such processes may include introducing a sample into a theCPBD 104, preparing a plurality of probes for taking a measurement ofthe sample, locating the probes proximate a target area on the sample,activating the probes to make contact with the target area, and/ortaking the measurement, among others. The communications among thedevices may be interpreted by the CR which, as described above, may beprogrammed into one or more of the devices of the apparatus 100.Consequently, the CR may instruct the devices of the apparatus 100 toinitiate, monitor, collect data related to, adjust and/or terminate aparticular process, such as preparing the probes or taking measurements,in response to communications received from the CPBD 104 and/or themeasuring device 106.

The CR may be programmed into a single computer or machine (e.g., a“master control computer”) that is responsible for directing theoperation of one or more of the positioner control device 102, the CPBD104 and the measuring device 106, at least in part, and may also beresponsible for controlling one or more of the steps, processes, actionsand/or operations described above. For example, a procedure forintroducing a sample into the CPBD 104 may be controlled by the samecomputer that operates the positioner control device 102 and that drivesprobes to a desired location, and/or by the same computer that controlsperipheral devices. In addition, Data Acquisition (DA) boards and otherDA devices may be implemented in the computer or machine operating thepositioner control device 102, for example, to enable the positionercontrol device 102 to take measurements that would otherwise beimplemented by a computer, machine or operation system of the measuringdevice 106. In embodiments in which the CR and operation of one or allof the devices of the apparatus 100 or APS reside on a single machine,communication among the various devices may be enabled via software. Inother embodiments, one or more of the positioner control device 102, theCPBD 104 and the measuring device 106 may comprise or be associated witha separate computer or machine to direct operation. In such embodiments,each device may be communicatively coupled by pathways such as wire,cable, network (e.g., TCP/IP network over Ethernet, 1394 connection,and/or USB, among others), or wireless protocol, among other means.Thus, communications between the devices of the apparatus 100 may beimplemented as logical operations and/or subsystems that are accessedvia a separate computer via a physical network, or may reside locally toa master control computer or other singular or plural computing device.

Referring to FIG. 2, illustrated is a block diagram of at least aportion of one embodiment of an apparatus 200 according to aspects ofthe present disclosure. The apparatus 200 is one environment by whichmessages communicated between the devices of the apparatus 100 may beimplemented. The apparatus 200 may be configured to fit within thechamber of the CPBD 104, including configurations in which components ofthe apparatus 200 are in communication with the positioner controldevice 102 and/or the measuring device 106, whether the positionercontrol device 102 and/or the measuring device 106 are also disposedwithin the CPBD 104 chamber or are external to the CPBD 104 chamber. Theapparatus 200 may also include one or more of the CPBD 104, thepositioner control device 102 and the measuring device 106. However, inthe illustrated embodiment, the apparatus 200 is a discrete component orsubassembly positioned within the chamber of the CPBD 104 andcommunicatively coupled to the CPBD 104, the positioner control device102 and the measuring device 106.

The apparatus 200 includes a manipulation platform 210 for manipulatingone or more samples within the CPBD 104. Manipulation of a sample mayinclude, without limitation, moving a sample in X, Y, Z, DX, DY and DZdirections. Manipulation of a sample may additionally or alternativelyinclude the determination of physical and chemical characteristics of asample, such as performing electrical, mechanical, optical, or chemicalmeasurements, or combinations thereof. In one embodiment, the apparatus200 includes a plurality of manipulation platforms 210, whethersubstantially similar or having varying configurations. The manipulationplatform 210 may also be reconfigurable, such as may allow the customalteration of the layout and/or functionality described below.

The manipulation platform 210 includes at least one base 206 on which aplurality of manipulator module interfaces 212 are arranged. Each of themanipulator module interfaces 212 are configured to receive amanipulator module 260. In the illustrated embodiment, the manipulationplatform 210 includes four manipulator module interfaces 212, andmanipulator modules 260 are coupled to two of the manipulator moduleinterfaces 212. However, other embodiments within the scope of thepresent disclosure may include a different number of manipulator moduleinterfaces 212 and/or manipulator modules 260. Moreover, eachmanipulator module interface 212 need not be identical to the othermanipulator module interfaces 212, and each manipulator module 260 neednot be identical to the other manipulator modules 260.

The manipulator platform 210 also includes a sample stage 215 configuredto receive one or more samples to be manipulated within the CPBD 104.The sample stage 215 may alternatively be a discrete component coupledto the manipulator platform 210 by mechanical fasteners, adhesive, orother means. The manipulator platform 210 may also include a pluralityof sample stages 215 each configured to receive one or more samples tobe manipulated within the CPBD 104.

The manipulator platform 210 also includes or is associated with aninterface 207 that is configured to couple the base 206 to an SEM orother device employed as the CPBD 104 in FIG. 2. The interface 207 maybe integral to the manipulator platform 210, or may be a discretecomponent coupled to the base 206 by mechanical fasteners, adhesive, orother means. The interface 207 may be or include a mechanical interface,an electrical interface, a combined mechanical/electrical interface, orseparate mechanical and electrical interfaces, among others. Thus, forexample, in an embodiment in which an SEM is employed as the CPBD 104 towhich the base 206 is coupled via the interface 207, a sample may bearranged on sample stage 215 and the manipulation platform 210 may bepositioned within the sample chamber of the SEM by way of an electricaland/or mechanical coupling to the SEM via the interface 207.Consequently, once the platform 210 is coupled to an SEM (or other CPBD104), a sample arranged on the sample stage 215 may be imagedsubstantially simultaneously with the manipulation of the sample via themanipulator modules 260.

As also depicted in the embodiment illustrated in FIG. 2, a positionercontrol device 102 may be coupled to the manipulation platform 210 viathe interface 207. Consequently, the CPBD 104 and the positioner controldevice 102 may be communicatively coupled such that communications maybe sent between the CPBD 104 and the positioner control device 102, aswell as communications with sensors located within these devices andconfigured to derive information for use in the RS, for example.

The positioner control device 102 may be programmed for automatedcontrol of the operation of manipulator modules 260 via the manipulatormodule interfaces 212. Thus, a CR as described above, which may includethe RS as a set of methods, may also be programmed into the positionercontrol device 102 to instruct the devices making up the apparatus 200(and/or the apparatus 100 of FIG. 1) to initiate, monitor, adjust orterminate one or more steps, process, actions or operations, and/or tocollect data related thereto. For example, in response to communicationsreceived from the CPBD 104 and/or the measuring device 106, the CRand/or another function or feature of the positioner control device 102may automate the initiation, monitoring adjustment, termination, and/ordata collection related to preparing probes, preparing a sample, imaginga sample or taking a measurement.

The embodiment shown in FIG. 2 also demonstrates that the measuringdevice 106 may be mechanically and/or electrically coupled to themanipulation platform 210. The measuring device 106 may be programmedfor automated control of the measurement or detection of characteristicsof a sample arranged on the stage 215. The coupling between themeasuring device 106 and the manipulation platform 210 may enablecommunication between the measuring device 106 and the positionercontrol device 102. Thus, in one embodiment, the measuring device 106,the positioner control device 102 and the CPBD 104 are collectivelycoupled, each to the other two, thereby at least partially composing anAPS as described above. As also described above, a CR comprising an RSconfigured to reference fixed and/or moving components of the measuringdevice 106, the positioner control device 102 and the CPBD 104,including relative movement of such components, can be programmed intoone or more of the measuring device 106, the positioner control device102 and the CPBD 104. Consequently, signals generated by the RS can becommunicated by and through the communicative couplings between themeasuring device 106, the positioner control device 102 and the CPBD104.

The positioner control device 102 may comprise any suitableprocessor-based system, such as a personal computer (PC), that may beconfigured to control the operation of one or more components of theapparatus 200. For example, the positioner control device 102 maycommunicate command signals (e.g., electrical signals) to themanipulator modules 260 via the manipulator module interfaces 212 tocontrol the operation of the manipulator modules 260. Such communicationmay be via one or more conductive traces and/or other types ofcommunication paths, such as those that may be extend along one or moresurfaces of the manipulator platform 210 to the manipulator moduleinterfaces 212.

The positioner control device 102 may also include software executableto control components of the apparatus 200. For example, softwareexecuted by positioner control device 102 may generate and/orcommunicate command signals to one or more of the manipulator modules260 via the manipulator module interfaces 212, possibly in an automatedfashion and/or responsive to user input received by the positionercontrol device 102, the measuring device 106, and/or the CR. Suchsignals may also be generated and/or communicated in response tofeedback or other communications received from the manipulator moduleinterfaces 212 and/or the manipulator modules 260, and/or tocommunications received by the positioner control device 102 from theCPBD 104.

In one embodiment, the manipulator modules 260 include logic forcommunicating their individual operative capabilities to the positionercontrol device 102. For example, a manipulator module 260 may compriselogic for transmitting information about its movement capabilities, suchas whether it is configured to generate translational movement in one ormore orthogonal dimensions, whether it can generate rotational movementabout one or more orthogonal axes, its current orientation, and/or otherinformation. The manipulator modules 260 may also include logic forcommunicating information about its end-effector and the type of probesassembled therein, where such information may again be communicated withthe positioner control device 102, among other components of theapparatus 200.

The manipulator modules 260 each couple to or otherwise interface with acorresponding manipulator module interface 212 on the platform 210. Forexample, each manipulator module 260 may include a communicationinterface (e.g., an electrical input and/or output interface) configuredto couple with the communication path of one or each of the manipulatormodule interfaces 212. In one embodiment, such a communication interfaceor other portion of the manipulator modules 260 may include conductivetraces for receiving input signals for controlling operation.Accordingly, coupling a manipulator module 260 to manipulator moduleinterface 212 can include contacting or otherwise coupling theconductive traces on each of the manipulator module 260 and themanipulator module interface 212.

The manipulator modules 260 may also include or be associated withmotion and/or displacement sensors. Signals from such sensors can alsobe routed into the positioner control device 102. Consequently, thepositioner control device 300 may be implemented with control softwareand/or hardware configured to monitor the position or orientation of amanipulator module 260 in real-time, as well as possibly calibrating orcorrecting the orientation. The positioner control device 102 may alsoinclude or be coupled to an imaging system, such as may be provided byor associated with the CPBD 104, and may thus perform or supportreal-time object recognition and positioning identification which may beemployed to control the orientation of the manipulator modules 260and/or end-effectors of the manipulator modules 260, possibly in anautomated manner.

At least with regard to some embodiments of automated processes that aredescribed herein, the CR may be programmed or otherwise configured torecognize conditions that may require human intervention. In suchembodiments, human intervention can be accommodated via a user interfacesuitable to such intervention. Additionally, or alternatively, the CRmay be configured for initiation by a higher level control routine, aswell as communication of system and/or process data with the higherlevel control routine.

Referring to FIG. 3A, illustrated is a flow-chart diagram of at least aportion of one embodiment of a method 300 a according to aspects of thepresent disclosure. The method 300 a may be performed or executed by theapparatus 100 of FIG. 1 and/or the apparatus 200 of FIG. 2, among otherapparatus according to aspects of the present disclosure. Moreover, oneor more portions of the method 300 a may be performed or executed in asubstantially automated manner. In one embodiment, the method 300 a issubstantially automated.

Additionally, aspects of the method 300 a and other methods within thescope of the present disclosure are applicable to single probe andmultiple probe applications. Thus, for the sake of simplicity andclarity, any reference herein to a plurality of probes or a multipleprobe method, process or application is also applicable to a singleprobe or a single probe method, process or application. Also, each ofthe processes, procedures, actions and operations described below ascomposing one or more embodiments of the method 300 a, as well as othermethods within the scope of the present disclosure, may independentlyinclude multiple processes, procedures, actions and/or operations.

The method 300 a may include a probe selection step or process 305 bywhich one or more probes are selected based on a characteristic to bemeasured or detected. The probes may alternatively, or additionally, beselected based on the manner of measuring or detecting thecharacteristic. For example, probes suitable for measuring an electricalcharacteristic of a sample may include, without limitation, probessubstantially comprising tungsten, platinum or gold wire, or probeshaving probe tips of such composition.

The selection of one or more probes by or during the process 305 may bemanual, partially automated or substantially automated. For example,manual embodiments of the process 305 may substantially rely on userinput. Partially automated embodiments of the process 305 mayautomatically perform a subset of the actions and/or decisions of theprocess 305. Automated aspects of partially automated embodiments mayinclude process initiation, process performance, process monitoringand/or adjustment (e.g., time, power, speed, force, etc.), processtermination, and/or process errors, among others. Substantiallyautomated embodiments of the process 305 may substantially rely onautomated robotics and/or other machinery or apparatus, and/orsubstantially automated computing hardware and/or software, such thatthe selection of probes during process 305 may be performed in thesubstantial absence of user input. This convention, where the extent ofautomation may substantially be inversely proportional to the amount ofuser input required or employed during a particular method or methodcomponent, or a particular apparatus or function thereof, is alsoapplicable to other aspects of the method 300 a, as well as to aspectsof other methods and apparatus within the scope of the presentdisclosure.

The method 300 a also includes a process 310 by which one or moreselected probes are introduced into the chamber of a CPBD. In oneembodiment, the process 310 may be at least partially automated, suchthat the probes may be introduced in the CPBD chamber with little or nouser input regarding the particulars of, for example, the orientationsor locations of the probes within the chamber. However, the process 310may alternatively be substantially manual or substantially automated.Introducing the probes into the CPBD chamber may also include removingthe probes from probe storage structure or locations, whether externalor internal to the chamber of the CPBD or other portion of any device,system or other apparatus employed with or including the CPBD.

A process 315 of the method 300 a includes positioning the tips of theprobes above contact points of a sample located in the CPBD chamber.Such positioning may be substantially manual, partially automated orsubstantially automated. In one embodiment, the positioning maysubstantially comprise horizontal positioning, such as in a plane thatis substantially parallel to a surface of a sample or a platformsupporting the sample within the CPBD, or in a plane that issubstantially perpendicular to a charged particle beam (CPB) generatedwithin the CPBD. Consequently, subsequent vertical positioning of theprobe or probe tips may be in a plane that is substantiallyperpendicular to the plane of horizontal positioning. Additionally,although many aspects described herein regarding positioning probes orprobe tips are described with respect to motion of the probes or tipsrelative to a stationary sample, such positioning may also includemotion of the sample (or the stage or platform supporting the sample)relative to a stationary position of the probes or probe tips, as wellas motion of both the sample and the probes or probe tips.

The positioning of the probe tips according to aspects of the method 300a (whether positioning horizontally, vertically or otherwise) may employthe RS, which is configured to positionally reference moving andstationary components relative to one another and/or to a commoncoordinate system, as described above. Thus, information regarding thelocation and/or orientation of the probe and/or the probe tips (relativeto the sample, manipulators installed within the CPBD chamber, and/or amap of the sample, for example) may be used by the RS to provideappropriate messages to the CR. Consequently, the CR may communicateappropriate messages to a positioner control device (e.g., thepositioner controller device 102 of FIGS. 1 and 2) to accuratelyposition the probes above the contact points of the sample. However, insome embodiments, the precision with which the probes or probe tips arepositioned over the contact points of the sample may be decreased, suchas when contact between the probe tips and the contact points may not benecessary, possibly due to the availability of positioning apparatusand/or methods other than those described with regard to the process315.

The CR may include one or more probe positioning sub-routines thatmonitor and/or detect the location and/or orientation of the probesrelative to contact points on the sample, which may be registered by theRS. The probe positioning sub-routines may also include procedures fordetermining when a probe has reached a desired location above a contactpoint. Exemplary procedures for probe positioning and determining whenthe probe has reached the desired location include, without limitation,image processing associated with the CPBD, employing the CPB to locatealignment marks of the sample and/or underlying platform, referencingmap data obtained by the RS, operating the CPBD in a teaching mode,referencing absolute coordinates on the sample (such as a list ofcoordinates previously determined), and executing an automated orsemi-automated “point and click” process.

A process 320 of the method 300 a includes establishing physical andelectrical contact between the probes and the contact points on thesample, such as by vertically translating the probes towards the samplevia the positioner control device. The probe positioning of the process320 may be substantially manual, partially automated or substantiallyautomated. When more than one probe is being used, the probes may belowered simultaneously, in groups, or one at a time, depending on theprogramming of the positioner control device, for example. In oneembodiment, the CR includes a procedure to maintain contact between theprobes and the sample until one or more measurement or detectionprocesses are completed. For example, upon contact between a probe tipand a contact point on the sample, a signal may be automaticallygenerated and transmitted to the positioner control device, which mayactivate a sub-routine of the CR. The activated sub-routine may includean automated process for determining the quality of the contact madewith the sample, among other processes.

One or more sample characteristics are measured or detected in a process330 of the method 300 a, wherein the process 330 may be substantiallymanual, partially automated or substantially automated. Theabove-described CR may activate a measuring device to perform themeasurement or detection, possibly upon receiving communications thatconfirm physical and/or electrical contact between the probe tips andcontact points. The measuring device may be substantially similar to themeasuring device 500 shown in FIGS. 1 and 2.

In some embodiments, the measuring device may be a commerciallyavailable device, and may include software and/or hardware forperforming or supporting the measurement or detection of samplecharacteristics. The measuring device employed in the process 330 of themethod 300 a may also have substantially similar aspects to measuringdevices described in U.S. Pat. No. 6,208,151, the entire disclosure ofwhich is incorporated herein by reference.

Although the embodiment shown in FIG. 3A depicts the method 300 a in aflowchart format, such format should not be interpreted to require thatthe depicted components of the method 300 a occur in series. Forexample, more than one of the depicted components of the method 300 acan also be performed simultaneously. One such example entails preparingone or more probes while employing another one or more probes to measureor detect characteristics of a sample, wherein such probe preparationmay be performed in-situ and/or ex-situ of the CPBD chamber in which thesample is being examined. The sequence of the components of the method300 a may also vary from the sequence depicted in FIG. 3A. Moreover, oneor more components of the method 300 a may be repeated or eliminated yetremain within the scope of the present disclosure.

Referring to FIG. 3B, illustrated is at least a portion of anotherembodiment of the method 300 a shown in FIG. 3A, herein designated byreference numeral 300 b. Embodiments of the method 300 b may include oneor more of the components of the method 300 a. For example, theillustrated embodiment of the method 300 b includes each of thecomponents of the method 300 a shown in FIG. 3A, as well as one or moreadditional components. Thus, the following description of the method 300b is substantially directed towards those components which were notexplicitly described with regard to the method 300 a, although merelyfor the sake of simplicity and brevity, and without limiting the scopeof either method 300 a or method 300 b within the scope of the presentdisclosure. Of course, embodiments of the method 300 a within the scopeof the present disclosure may also include one or more of the componentsof the method 300 b shown in FIG. 3B.

The method 300 b may include a process 345 by which ex-situ preparationof one or more probes may optionally be performed. Consequently, theprocess 345 is depicted in FIG. 3B by dashed lines, in contrast to solidlines. This convention, in which optional processes, steps, actionsand/or operations are depicted in dashed lines, as well as thedirectional indications (arrows) depicting the sequence of suchcomponents, is hereafter followed merely for the sake of clarity.Moreover, the depiction of any method, method component or sequenceindicator by solid lines, in contrast to dashed lines, does not implythe necessity of such method, component or sequence in any particularembodiment, or otherwise limit the scope of the present disclosure toonly those methods that include each aspect depicted by solid lines. Tothe contrary, any aspect depicted by solid lines or dashed lines inFIGS. 3A and 3B, or any other figure of the present disclosure, may beoptional in one or more of the myriad apparatus and methods within thescope of the present disclosure.

The probe preparation performed by the process 345 may include thepreparation, conditioning and/or characterization of one or more probes,as described above. However, as also described above, such preparation,conditioning and/or characterization may be collectively referred toherein as “preparation.” Nonetheless, some methods within the scope ofthe present disclosure may not include preparation, conditioning andcharacterization of one or more probes, but may specifically includeonly: (1) preparation; (2) conditioning; (3) characterization; (4)preparation and conditioning; (5) preparation and characterization; or(6) conditioning and characterization; where preparation may include oneor more processes exclusive of conditioning and characterization. Also,as described above, aspects described herein as applicable to a singleprobe may also be applicable to multiple probes, aspects describedherein as applicable to multiple probes may also be applicable to asingle probe, and the same hold true for single and multiple probe tips.

The process 345 may be an ex-situ process in the sense that the probesbeing prepared by the process 345 undergo such preparation at a locationoutside of the chamber of the CPBD in which the probes are to beemployed to measure or detect a characteristic of a sample oriented inthe CPBD. Ex-situ preparation of the process 345 may include one or moreprocesses for determining whether the characteristics of a selectedprobe are appropriate for the desired measurement or detection for whichthe probe is to be employed. Additionally, or alternatively, the ex-situpreparation of the process 345 may include one or more processes foreffecting remedial measures (e.g., additional or optional probepreparation) if the characteristics of the probe are not appropriate forthe intended measurement or detection.

For example, oxide or other contamination that may hinder the utility ofa probe as a measuring device may form on the probe tip prior tointroducing the probe into the CPBD chamber. Consequently, the ex-situpreparation of the process 345 may include one or more chemical dipprocesses that may remove or reduce such contamination. Such processesmay include one or more hydrofluoric acid or potassium hydroxide dipprocesses, among others. The ex-situ preparation of the process 345 mayalso or alternatively include one or more process to sharpen the tip ofa probe, such as to improve utility when employing the probe to measurea characteristic of a sample. However, the method 300 b may not includethe process 345, such as when a selected probe is adequately preparedwithout requiring ex-situ preparation, possibly including embodiments inwhich the above-described probe preparation is performed in-situ oncethe probes have been introduced into the CPBD chamber. Nonetheless, inembodiments including the ex-situ probe preparation of the process 345,such preparation may be substantially manual, partially automated orsubstantially automated.

The ex-situ preparation of the process 345 may also include sharpening,bending, shaping or other mechanical processing of one or more probes.Such mechanical processing may affect the entire probe or merely aportion of the probe, such as the probe tip, stem or body, for example.In one embodiment, the mechanical processing includes bending the probeto facilitate a dip process, such as one or more of those describedabove. For example, some probes may be manufactured from wire materialstock and, thus, have a substantially cylindrical shape, wherein themechanical bending process may place one or bends or turns in probe. Inone embodiment, only one bend may be formed, such that the resultingprobe has a substantially L-shaped profile, although the bend may not besubstantially 90 degrees (e.g., the bend may be about 30 degrees in someembodiments, 45 degrees in other embodiments, and 60 degrees in otherembodiments). In embodiments in which the probe is bent to include morethan one turn, the bent probe may have a zigzag profile, a Z-shaped, orotherwise. Moreover, where probes are mechanically processed to includemore than one bend, the bends may be in different planes. For example, afirst bend may be in a first plane and a second bend may be in a secondplane, where the first and second planes are not coincident, andpossibly not parallel.

In embodiments in which ex-situ probe preparation of the process 345 isperformed, the CR may implement procedures for the probe preparation asa set of procedures by which the selected preparation process orprocesses may be monitored by sensors, or by duration of suchprocessing, among other possibilities within the scope of the presentdisclosure. In one embodiment, the progress and/or completion of one ormore probe preparation processes may be monitored or determined byimaging, such as via communication of an appropriate termination signalwhen the ex-situ preparation is complete.

The method 300 b may also include a process 350 by which one or moreselected probes are stored in the chamber of the CPBD. The process 350may be substantially manual or partially automated. However, in oneembodiment, the process 350 is substantially automated, such that theprobes may be stored in the CPBD chamber with little or no user inputregarding the particulars of, for example, the storage orientations orlocations of the probes within the chamber.

The method 300 b may also include an in-situ process 355 by which one ormore probes may undergo probe preparation while located inside thechamber of the CPBD. The in-situ probe preparation of the process 355may be substantially manual or partially automated. However, the in-situprobe preparation of the process 355 may also be substantiallyautomated, possibly by employing an automated probe preparation system(APPS). The APPS may also be referred to herein or elsewhere as anautomated probe conditioning system and/or an automated probecharacterizing system. In one embodiment, the APPS may be implemented asa part of the CR described above, such that the APPS also describedabove may be operable to prepare one or more probes via an automatedprocess.

Embodiments of the above-described APPS may comprise one or moresensors, electrodes or counter electrodes, which may be operable tosense the presence of a probe (e.g., in the CPBD chamber) such that thesensor, electrode or other component of the APPS can subsequently bepositioned proximate the probe. Alternatively, or additionally, theprobe may be positioned proximate the sensor or other component of theAPPS. The proximity of the probe and the APPS component may be aboutfive cm or less, but may also include actual contact between the tip andthe APPS component, depending on the type of probe preparation to beperformed. When the desired proximity has been reached, the sensor orother APPS component may communicate a signal to the CR indicating such,which the RS may use to register the location of the probe tip (e.g., aslocated at an absolute location or a location relative to a coordinatesystem of the RS).

When a probe tip location has been registered, the CR may automaticallyinitiate a selected sub-routine, which may be or include a process forprobe preparation. The process selected for initiation by the CR,whether automated or not, may depend upon CR programming.

In embodiments in which the selected process includes probecharacterization, the tip diameter, probe material and probe geometrymay be measured and/or detected, among other possible physical and/orchemical properties of the probe and the probe tip. Such properties maybe examined by one or more processes which may include, withoutlimitation, field emission measurements, visual observation (e.g., withan SEM), energy dispersive x-ray spectroscopy (EDX), and scanning augermapping. Implementation of these and other probe characterizationprocesses may be controlled by instructions (such as sub-routines) thatare provided as a part of the CR. Thus, the CR may be configured toinitiate such processes, monitor their progress, and implementappropriate termination commands for the processes, among other actions.

In embodiments in which the selected process includes probeconditioning, instructions (such as sub-routines) for implementingvarious conditioning procedures may be programmed as a part of the CR.Thus, the CR may also or alternatively be configured to initiate suchprocesses, monitor their progress, and implement appropriate terminationcommands for the processes. Probe conditioning processes which may beselected can include decontaminating the probe or probe tip and/orsharpening the probe tip, among others. In one embodiment, the CR may beconfigured to implement a timer which may be employed in associationwith the initiation and/or termination of one or more probe conditioningprocedures. A loop may also be provided within the CR such that one ormore conditioning procedures may be repeated for one or more probesuntil an improved, desired or threshold level of conditioning isachieved. The selection of the one or more probe conditioningprocedure(s) may depend on which property of the probe tip requiresimprovement, at least in part.

In one embodiment, the APPS may be implemented in the CR as asub-routine to provide commands for performing one or more of thefollowing: (1) pulsing; (2) heating with, for example, e-beam, separatefilament, laser, or electron bombardment; (3) field emission; (4) fieldionization; (5) field evaporation; (6) field surface melting; (7) ionbombardment/ion milling/ion sputtering; (8); in-situ metal deposition;(9) metal dipping; (10) mechanical deformation of the tip; and (10) anelectric charge forced dynamic hot metal flow tip formation (a processreferred to hereafter as electric tip processing, or ETP).

Pulsing employed during probe conditioning may comprise contacting thetips to drive current through the probe to remove contamination from thetip. Heating employed during probe conditioning may include heating byelectron bombardment, wherein free electrons are generated by a heatedfilament and accelerated by an electric field to collide with the probetip, thereby heating the tip by conversion of kinetic energy to thermalenergy. This and/or other methods of heating a probe tip may be employedduring probe preparation (e.g., probe conditioning) to desorb oxides andadsorbates, thereby cleaning the tip.

Field emission processes which may be employed for probe preparation mayinclude operating a field emission at a high current, which leads tochanges of the tip geometry, thereby conditioning the probe tip. Fieldionization processes which may be employed for probe preparation mayinclude cleaning the probe tip by applying a high energy field to ionizeatoms on the tip. In-situ metal deposition processes which may beemployed for probe preparation may include sputtering a metal on theprobe tip. Metal dipping processes which may be employed for probepreparation may include dipping at least the tip portion of the probeinto a molten source of metal. Mechanical deformation processes whichmay be employed for probe preparation may include pulling or forgingbulk metal and/or other materials to make a sharp probe tip.

ETP may be employed to clean and/or sharpen a probe or probe tip in anon-oxidizing environment using electric current, electric field, andthermal mobilization of atoms, such as metal atoms where the probe orprobe tip has a substantially metallic composition. One embodiment ofETP which may be employed to clean and sharpen a probe tip includesbringing a dull probe (to be sharpened) and a thin probe into closeproximity. Thereafter, the probes are biased at different voltages suchthat any oxide or other dielectric or contaminant that is interposingthe two probe tips breaks down. For example, the bias differentialacross the probe tips may be about equal to or greater than thebreakdown voltage of the oxide, air or other material interposing theprobe tips, such that current flow may be established between the twoprobes. Such oxide may have been previously formed or allowed to form,or may have undesirably formed, and its existence may have beenpreviously confirmed or merely suspected. In one embodiment, the probesare biased to a relative differential of about 70 volts.

The resulting current between the two probe tips can be sufficient tocause local melting of the thinner probe tip. As the thinner probe tipmelts, or as the atoms of the metal become substantially mobile, theelectric field driving the electric current between the two probescauses the melted metal of the thinner probe to be accelerated towardsthe larger probe. If this occurs rapidly enough, the majority of themelted metal may deposit onto the larger probe, while the material atthe core of the thinner probe may substantially remain in a solid phase.The transfer of metal from the thinner probe to the larger probe canform a gap between the two probe tips, wherein growth of the gap duringongoing metal transfer from the thinner probe to the thicker probe canbe allowed to continue until the gap creates sufficient separationbetween the probe tips to terminate the electric current established bythe voltage differential. ETP can, in some embodiments, clean and/orsharpen the thinner probe.

ETP may be performed either ex-situ or in-situ relative to the CPBDchamber employed to characterize a sample. The process environment inwhich ETP may be performed may also vary based on the compositionsand/or geometries of the two probe tips, among other possible factors.For example, ETP may be performed in an ambient environment (e.g., roomtemperature air) or an inert gas environment, possibly at an elevatedtemperature (e.g., about 1000° C.). ETP may alternatively be performedin a substantial vacuum, such as at a nominal or maximum vacuumattainable within a chamber of a CPBD.

Another probe preparation process that may be performed during theprocess 355 (and/or elsewhere in the method 300) is a cross-probecleaning process. In one embodiment, a cross-probe cleaning process mayinclude positioning the stem or body portions of two or more probes inclose proximity, or in contact, in a mutually orthogonal orientation,such as forming a shape resembling a cross. However, in otherembodiments the probes may not be mutually orthogonal, but may beoriented at a relative angle less than about 90 degrees (e.g., about 30degrees). Thereafter, electrical current may be directed through theprobes (possibly a single current if the probes are in physicalcontact), such that the probes are heated by resistive heating orotherwise to an elevated temperature. At high temperatures, oxidesand/or other contaminants previously formed or deposited on the probetips may dislodge. This process may be performed as an alternative to,or in addition to, one or more of the probe processing proceduresdescribed above.

The above-described APPS may include one or more of the foregoing probepreparation procedures, one or more of which may be implemented as asubstantially automated process as described herein, although one ormore of the probe preparation procedures may also or alternatively bepartially automated and/or substantially manual. Nonetheless, inembodiments in which one or more probe preparation procedures areemployed, and the one or more probe preparation procedures collectivelyterminate, the CR may communicate to the positioner control device orthe CPBD that such collective termination has occurred, and/or that theprobes are properly prepared for the subsequent, intended samplecharacterization. Such communication may also be implemented as asubstantially automated function.

The method 300 b may also include a process 380 by which probes and/orprobe tips installed in a manipulator or other positioning device withina CPBD chamber can be exchanged with additional probes and/or probe tipsstored within the CPBD chamber. For example, an end-effector racklocated within the CPBD chamber and accessible by the manipulator maystore replacement probes and/or probe tips which are substantiallysimilar to those installed in a manipulator, such that one or moreprobes and/or probe tips that become excessively dull or contaminatedcan be replaced with sharper or cleaner probes and/or probe tips.However, the probes and/or probe tips stored in the end-effector rackmay also be configured for a different type of measurement or detectionof a sample characteristic relative to the type of measurement ordetection for which the probes and/or probe tips installed in themanipulator are configured. Additionally, or alternatively, the probesand/or probe tips stored in the end-effector rack may be configured formeasuring or detecting a different characteristic of the sample relativeto the sample characteristic for which the probes and/or probe tipsinstalled in the manipulator configured to measure or detect.

The exchange of probes and/or probe tips between the manipulator and theend-effector rack may be substantially manual, partially automated orsubstantially automated. In addition to the exchange of probes, probetips and/or end-effectors, the process 380 may include processes forpositioning the manipulator proximate the rack or other storagestructure where the additional end-effectors are stored, testingexchanged end-effectors, and repositioning the manipulator towards aprobe preparation area or the sample being examined, among otherpossible processes. One or more of the procedures of the process 380 maybe implemented by instructions or sub-routines in the APS describedabove, such as in the CR associated with the APS.

The end-effector rack described may substantially resemble a rackstructure, possibly similar to the apparatus 500 shown in FIG. 5 anddescribed below. However, other end-effector storage structureconfigurations are also within the scope of the present disclosure. Forexample, the end-effector rack may be, include or resemble a revolvingor static carousel, cartridge or other structure. The end-effector rackmay also be or include electromechanical apparatus, such as may beemployed to partially automate, substantially automated or otherwiseassist dispensing end-effectors and/or replacing or rejuvenatingend-effectors according to aspects of the present disclosure. However,for the sake of simplicity, reference herein to the end-effector rack

The method 300 b may also include a process 385 by which probes and/orprobe tips can be rejuvenated by cleaning and/or shaping, for example.The rejuvenation of the process 385 may include one or more of the probepreparation processes described herein or otherwise within the scope ofthe present disclosure. The process 385 may be substantially manual,partially automated or substantially automated. For example, one or moreof the procedures of the process 385 may be implemented by instructionsor sub-routines in the APS described above, such as in the CR associatedwith the APS.

The method 300 b may also include a process 340 by which a sample may beremoved from a sample examination area within a CPBD, includingcompletely removing the sample from the CPBD. Such removal may besubstantially manual, partially automated or substantially automated. Inone embodiment, after all desired characteristics of a sample have beenmeasured or detected, the CR may execute instructions or sub-routines toreturn the manipulator or other positioner to the end-effector rack toexchange end-effectors, while simultaneously removing the examinedsample and preparing a new sample for introduction into the CPBDchamber, which may be implemented by employing grippers, tweezers,and/or other tools and/or methods, including those known to those ofordinary skill in the art.

The method 300 b may also include one or more procedures by which one ormore samples internal or external to the CPBD chamber may be processedprior to and/or after examination. Such procedures may include ex-situprocessing of two or more samples in parallel or in series, in-situprocessing of two or more samples in parallel or in series, and/orex-situ processing of one or more samples in parallel or in series within-situ processing of one or more samples. Such processes may include aprocess 360 by which a device-under-test (DUT) may be de-processed, anex-situ process 365 which may be employed to prepare a DUT forexamination prior to introducing the DUT into the CPBD, and/or a process370 by which a DUT may be transferred to or otherwise introduced intothe CPBD, among other possible DUT processing procedures. Furtherexamples include an in-situ process 375 by which a DUT which may beemployed to prepare a DUT for examination once the DUT is introducedinto the CPBD, a process 390 which may be employed to coarsely and/orprecisely position or orient a DUT within the CPBD chamber, and aprocess 395 may be employed to remove a DUT from the CPBD, among otherpossible DUT processing procedures, as well as combinations of ones ofthese and other processes.

Thus, one or more embodiments of the method 300 b may generally includea plurality of such DUT preparation procedures, which may collectivelybe referred to herein as DUT preparation 397. In the embodimentillustrated in FIG. 3B, the method 300 b includes DUT preparation 397which includes each of processes 360, 365, 370, 375, 390 and 395. Ofcourse, in other embodiments, the method 300 b may include DUTpreparation 397 which varies from the embodiment shown in FIG. 3B.

A DUT may be substantially similar to one or more of the samplesdescribed above as capable of being examined within a CPBD to measure ordetect characteristics thereof. Alternatively, a DUT may be or includeat least a portion of a particular transistor or other device formed onor integral to such samples. Nonetheless, for the sake of simplicity,the terms “sample” and “DUT” may sometimes be interchangeable withregard to some aspects of the present disclosure.

The process 360 of method 300 b may be or include one or more optionalprocedures for de-processing a sample. In one embodiment, such samplede-processing includes removing one or more layers of the sample toexpose a feature of interest on the sample. The process 365 of method300 b may be or include one or more optional procedures for preparing asample for introduction into the CPBD, including procedures other thanthe de-processing procedures of the process 360. One or both of theprocesses 360 and 365 may be substantially manual, partially automatedor substantially automated. For example, such de-processing and/orsample preparation may be implemented by the CR as automatic processesof the APS. In one such embodiment, procedures for de-processing and/orpreparing a sample are initiated, adjusted, and terminated by sensorsoperable to monitor the status of the procedure. The sensors and the CRcommunicate to effect the procedure as an automated process. Whilemyriad procedures may be employed for sample preparation, examplesinclude chemical cleaning (e.g., by HF dip),chemical-mechanical-polishing or chemical-mechanical-planarizing(collectively referred to herein as CMP), self-assembled monolayer (SAM)deposition (such as after cleaning to prevent oxidation), selectivedeposition of one or more conductive and/or passivation layers (e.g., toprevent oxidation), and selective deposition of liquid metal and/ornon-oxidizing metal, among others.

The process 370 of method 300 b may include transporting the sample intothe CPBD chamber, possibly from a sample load station that may besubstantially similar to or include a load lock, a wafer cassette, awafer tape/ring, a GEL-PAK or other waffle pack, and/or a vacuum-releaseor other type of tray, among other means for securing a sample duringtransport. An automated sample transport system (ASTS) may beimplemented as a part of the CR described above, for example, may beemployed to load and unload samples relative to the CPBD chamber. Forexample, the ASTS may be implemented as a set of methods or sub-routinesto monitor status and/or location of relevant devices, and/or toimplement or provide commands.

The ASTS may be enabled by appropriate software and hardware tocommunicate information used by the CR and/or the RS. In addition tohardware and software supporting such communications, the ASTS mayinclude or be associated with a transport mechanism configured toprovide the physical, mechanical aspect of transferring samples betweena sample load station and the sample chamber. For example, the transportmechanism may include one or more electric motors, piezoelectric motors,MEMS motors, and/or pneumatic actuators, among other motion impartingapparatus, and may also include apparatus or features employed forfriction reduction.

The one or more in-situ procedures of the process 375 may include sampleconditioning or other sample preparation that employs the CPBD, as wellas focused-ion-beam (FIB) sputtering, non-liquid-metal-ion-sourcesputtering, ion gun sputtering, plasma cleaning, reactive gas cleaningand/or radical cleaning (e.g., to remove radicals), any of which can beimplemented through instructions or sub-routines of the CR. In oneembodiment, process 375 includes cleaning the sample in-situ with amethod of plasma cleaning using an EVACTRON device commerciallyavailable from XEI Scientific, Redwood City, Calif. Generally, suchdevices can use a low-powered RF plasma to make oxygen radicals from airthat then oxidize and chemically etch away hydrocarbons (e.g., from theinterior surfaces of an SEM and/or samples, probes and other itemstherein). As described in operations manuals available with the EVACTRONdevice, the device is mounted on a specimen chamber port. The plasmaitself is confined to the EVACTRON chamber, which prevents ion andelectron bombardment damage to the instrument or sample. The radicalsare carried out of the plasma into the whole of the specimen chamber byconvection. These radicals oxidize hydrocarbons to make CO, H₂O, and CO₂gases to be removed by a vacuum pump.

The process 380 may include grounding the sample at the point orlocation where it will be probed, possibly relative to the CPBD chamber.In one embodiment, the sample is grounded to the stage, platform orother structure supporting the sample within the chamber. However, thesample may be suspended within the chamber, such as by bonding, graspingor otherwise coupling one or more probes with one or more surfaces orfeatures of the sample, wherein one or more additional probes may beemployed acquire the desired sample characteristic.

In one embodiment of the method 300 b, once a sample has been introducedinto the CPBD chamber (e.g., by process 370) and optional in-situ samplepreparation is performed (e.g., by process 375), the presence of thesample within the CPBD chamber may be communicated to the CR. Possiblyupon also receiving information that probes are properly prepared and/orthat the sample is adequately grounded within the CPBD chamber, the CRmay access the RS and the positioner control device to locate the probetips above contact point or other a feature of interest on the sample,among other actions. In this context, “above” the contact points refersto a position from which a final trajectory to the contact point can bedetermined and executed. For example, such a position from which thefinal trajectory originates may be normal to a plane in which thecontact points collectively reside.

Referring to FIG. 4, illustrated is a perspective view of at least aportion of one embodiment of a positioner 400 according to aspects ofthe present disclosure. The positioner 400 is one example of theabove-described positioners or manipulators that may each be employed toposition one or more probes 440 employed during the measurement ordetection of a characteristic of a sample being examined in a CPBD, suchas within the apparatus 100 of FIG. 1 or the apparatus 200 of FIG. 2,and/or according to aspects of the methods 300 a or 300 b shown in FIGS.3A and 3B, respectively. The positioner 400 and other manipulatorswithin the scope of the present disclosure may have a resolution that isabout equal to the resolution of the CPBD in which the positioner isemployed, and/or about equal to the dimensions of the features beingexamined on a sample within the CPBD. In other embodiments, theresolution of the positioners may be greater (i.e., smaller increments)than the resolution of the CPBD and/or sample feature dimensions.Nonetheless, aspects of the present disclosure are also applicable toembodiments in which the positioner resolution is less than theresolution of the CPBD and/or sample feature dimensions.

For example, the probes 440 of the positioner 400 may be selectedaccording to aspects of the selection process 305 of the method 300 ashown in FIG. 3A. The probes 440 may also be exchanged according toaspects of the exchange process 380 of the method 300 b, such as toreplace dulled and/or contaminated probes with sharper and/or cleanerprobes, or where probes of different utility are appropriate based on aparticular characteristic being collected or a particular sample orsample feature being examined.

The positioner 400 may include an end-effector 444 to which the probes440 may be permanently or detachably assembled. The probes 440 may be orinclude tungsten polycrystalline wire probes, possibly having a “stem”diameter ranging between about 0.25 mm and about 0.50 mm and a taperedtip, where the radius of curvature of the tip apex may be less thanabout 10 nm.

The end-effector 444 may be permanently or detachably coupled to apositioner body or handle 450. For example, a detachable coupling may beaccomplished via one or more corresponding pairs of prongs 454 andsockets 448. Thus, in one embodiment, the end-effector 444 may includeone or more examination probes (440) and one or more assembly probes(454, employable to assemble the end-effector 444 with the positioner450). Each prong/socket pairing may correspond to one of the probes 440,as in the illustrated embodiment, or may correspond to more than one ofthe probes 440. Similarly, each socket 448 may be electrically connectedto one or more leads extending from the body 450. However, other meansfor detachably coupling the end-effector 444 or probes 440 to thepositioner 450 are also within the scope of the present disclosure.

The end-effector 444 may also be configured to be stored in or otherwiseinterface an end-effector rack, such as described above. In oneembodiment, as illustrated in FIG. 4, the end-effector 444 may have oneor more flats 446, and/or one or more other interfaces corresponding toor configured to cooperate with the end-effector rack. The flats 446 oranother portion of the end-effector 444, including a portion configuredto interface with an end-effector rack, may have a predeterminedorientation relative to the probes 440, such that the orientation of theprobes 440 may be known once the end-effector 444 is coupled to the body450. For example, the flats 446 may include two substantially parallelflats on opposing sides of the end-effector 444, and the orientations ofeach of the probes 440 may be known relative to one or more edges orsurfaces of the flats 446.

Referring to FIG. 5, illustrated is a perspective view of at least aportion of one embodiment of an apparatus 500 according to aspects ofthe present disclosure. The apparatus 500 includes an end-effector rack555 which may be substantially similar to the end-effector rack(s)described above. The apparatus 500 also includes a plurality ofend-effectors 440 which may be substantially similar to the end-effector440 shown in FIG. 4. The apparatus 500 also includes a manipulatormodule 560 which may be substantially similar to the manipulator modulesdescribed above, such as the manipulator module 260 shown in FIG. 2. Themanipulator module 560 may include a positioner or positioner body 450which may be substantially similar to the positioner body 450 shown inFIG. 4.

The manipulator module 560 is coupled to a manipulator module interface511 of a manipulation platform 510. The manipulator module interface 511and the manipulation platform 510 may be substantially similar to themanipulator module interfaces 212 and the manipulation platform 210,respectively, shown in FIG. 2. For example, the manipulator module 560and the manipulation platform 510 may be configured to be installedwithin a CPBD chamber, such as the CPBD 104 shown in FIG. 1 or the CPBD104 shown in FIG. 2.

As shown in FIG. 5 and discussed above with regard to FIG. 4, aplurality of probes 440 may be assembled into respective end-effectors444. However, in addition to probes 440, one or more tools, includingthose having different capabilities, may be assembled into one or moreof the end-effectors 444. When an end-effector 444 so assembled iscoupled with a positioner 450, the positioner 450 can have more than onemeasurement or detection capability, and possibly more than onemanipulation capability. Such manipulation capability may used inconjunction with and/or in support of measurement and/or detection ofone or more characteristics of one or more samples being examined withina CPBD. For example, multiple independent electrical probes 440 can beassembled in an end-effector 444, whereby a positioner 450 with such anend-effector 444 may be useful for measuring different kinds of samples.In addition, multiple positioners 450 equipped with end-effectors 444having multiple probes 440 assembled therein can be used to takemeasurements according to the automated processes described herein.

In addition, features of any given sample may require that the probes440 be reconfigured or moved independently. Thus, in some embodiments,one or more independent fine-motion positioners may be associated withone or more coarse-motion positioners, where one or more of thefine-motion and coarse-motion positions may be substantially similar toother positions or manipulators described herein, with the possibleexception of scale.

The probes 440 assembled in an end-effector 444 coupled with apositioner 430 may be reconfigured to enable measurements of sampleshaving different feature configurations. For example, some of the probes440 may be flexible, such that they can be reconfigured with micro-scaleand/or nano-scale embodiments of the positioners described herein orotherwise. In one embodiment, a first positioner may be orientedproximate a second positioner such that the first positioner may graspor otherwise interface the second positioner or one or more probesassembled in the second positioner, such as to pull, bend or otherwisereposition the one or more probes after their initial orientation by thesecond positioner. These and other manipulations within the scope of thepresent disclosure may be performed before or after the probes areintroduced into the sample chamber of a CPBD (i.e., either ex-situ orin-situ relative to the CPBD).

In one embodiment, the probes 440 are assembled into the end-effectors444, and the end-effectors 444 are arranged in the end-effector rack555, such as in one or more of the illustrated end-effector stations 558configured to receive and retain an end-effector 444 when not being usedto measure or detect sample characteristics. The end-effectors 444 maybe installed in the end-effector rack 555 by an ex-situ or in-situprocess, which may be substantially manual, partially automated orsubstantially automated. Thereafter, the end-effector rack 555 may becoupled to a manipulator module interface 511 of the manipulationplatform 510, either before or after the manipulation platform 510 hasbeen positioned within a CPBD chamber.

The end-effector rack 555 may be introduced into the CPBD chamber by oneor more processes which may collectively be substantially manual,partially automated or substantially automated. For example, prior tointroduction into the CPBD chamber, the end-effector rack 555 may beintroduced into a load lock where sensors may determine pressure and/orother conditions of the load lock and/or CPBD chamber, and suchconditions may be communicated to the above-described CR to determinewhen the proper conditions exist for transporting the end-effector rack555 from the load lock into the CPBD chamber. One embodiment of asubstantially automated process by which the end-effector rack 555 maybe transported from the load lock to the CPBD chamber includes the useof a feeder, a conveyor, a parts loader, or similar transfer mechanisms,including those that may be equipped with location sensors or otherlocation features. The transfer mechanism may also be configured tocommunicate to the CR information regarding when an end-effector 444 hasbeen positioned within the CPBD chamber.

Once the end-effector rack 555 has been positioned within the CPBDchamber, exchange of an end-effector 444 from the end-effector rack 555to a positioner 450 may be accomplished, such as by presenting the rack555 to the positioner 450. A positioning stage of the manipulator module560 may position the rack 555 and the positioner 450 so that prongs 454of an end-effector 444 and sockets 448 of a positioner 450 arecoincident. The positioning stage may then translate or otherwise moveaway from the end-effector station 558, such as in a directionconsistent with the function of the illustrated “U” shaped geometry ofthe end-effector station 558. Of course, one or more of the end-effectorstations 558 may have other geometries. This process may also bereversed, substantially, such as may be employed to exchange anend-effector 444, or other processes in which an end-effector 444 may bereturned or otherwise assembled to the end-effector rack 555 by using apositioner 450. Such processes may by substantially manual, partiallyautomated or substantially automated, possibly in a similar manner asthe removal of an end-effector 444 from the end-effector rack 555. Forexample, communications may be determined and sent by and throughoperations of a positioner control device or other feature configured tocontrol operation of the positioner 450, and communications may also bedetermined and sent by and through operations of the CPBD and/or the CR.

Referring to FIG. 6, illustrated is a flow-chart diagram of at least aportion of one embodiment of a method 600 according to aspects of thepresent disclosure. The method 600 may be employed in a partially orsubstantially automated point-and-click process, and/or in or with theabove-described RS, such as for probe positioning. Thus, for example,the method 600 may be implemented in or performed by the apparatus 100of FIG. 1 or the apparatus 200 of FIG. 2. Consequently, the method 600may be performed in conjunction with the apparatus 400 shown in FIG. 4and/or the apparatus 500 of FIG. 5. The method 600 may also be used orperformed in conjunction with embodiments of the methods 300 a or 300 bshown in FIGS. 3A and 3B, whether in a substantially parallel, serial orinterlaced manner. The method 600 may also be implemented in accord withthe APS, CR and/or RS described above.

The method 600 may be performed to achieve probe positioning that isguided by probe-current imaging. Aspects of probe-current imaging may besimilar to aspects of specimen-current imaging, a process known by thoseskilled in the art. However, according to aspects of probe-currentimaging, electrical current is conducted through the probe in contrastto (or in addition to) electrical current conducted through a sampleunder investigation. Probe-current imaging may include measuring currentfrom or between one or more probes, a sample and/or ground, such as afunctions of the raster location or coordinates of the CPB of a CPBD (asa “map,” for example).

When a semi-automated point-and-click process is used, the probingprocess may at least temporarily depart from any then-functioningautomation scheme. However, once probes have been properly located abovecontact points, such automation may resume, such as where a positionercontrol device may communicate signals to CR, which may loop the probingback into the automated scheme.

The method 600 includes a process 605 by which a DUT (device-under-test)may be imaged, such as by an SEM or other CPBD. The process 605 may alsoinclude imaging one or more probes with the CPBD, possibly including allof the probes that may be assembled to a positioner or otherwisecontrolled by a manipulator module or positioned control device. The DUTand the imaged probes are then displayed on a computer screen or otherdisplay device associated with the CPBD in a process 610.

User input may then be received by a process 615. For example, a userviewing the display of the process 610 may indicate which of the imagedprobes is desired to be located from its imaged location. Suchindication may be in the form of a mouse click, where the usermanipulates a mouse to locate a pointer over the image of the desiredprobe or other imaged feature and then clicks a button on the mouse. Ofcourse, user input means other than or in addition to computer mouseoperations are also within the scope of the present disclosure. For thesake of simplicity, the initial, imaged location of the probe selectedby the user will be referred to as Location 1.

A subsequent process 620 also includes receiving user input. However,during this process, the user indicates a location to which the userdesires the probe selected during the process 615 is to be translated.For the sake of simplicity, this target location indicated by the usermay be referred to as Location 2. The user may indicate Location 2 in amanner substantially similar to the user's indication of Location 1(e.g., by mouse-click).

The target location may be substantially coincident with the contactpoint or other feature of interest on a sample being examined. However,the target location and feature of interest may not be substantiallycoincident in some embodiments within the scope of the presentdisclosure. For example, some devices being examined within the CPBD maybe damaged by direct exposure to the CPB of the CPBD. In such scenarios,and possibly others, the target location may merely be in the vicinityof the feature of interest, but not coincident, such as when the targetlocation may be slightly offset from the feature of interest, possiblyin a direction conforming to a probe relocation path.

The method 600 may also include a process 625 facilitating the receiptof user input indicating a desired or preferred relocation path. Forexample, a user may desire that the relocation path along which theselected probe should travel to the target location (i.e., the pathconnecting Location 1 and Location 2) may avoid an obstacle or area ofthe DUT or sample, or that this relocation path be the shortest pathpossible. In another example, the user may desire that the relocationpath comprise a plurality of arcs connected end-to-end, possibly havingsubstantially similar radii, or a plurality of similarly-shaped loops.

The method 600 proceeds from one of process 620 and the process 625 to aprocess 630 during which the SEM or other CPBD device may be adjusted tolimit exposure of its charged particle beam (CPB) to the probe selectedby the user during the process 615. For example, the CPBD may beswitched to a spot mode (in contrast to a raster mode, an unfocusedmode, or a broader illumination mode, for example), and the subsequentlynarrowed CPB may be focused on the selected probe. In anotherembodiment, the non-selected probes may be hidden, sheltered or maskedfrom the CPB, or other processes may be performed such that only theprobe selected during the process 615 may be exposed to the CPB. Theexposure of the selected probe to the CPB may continue during subsequentprocesses or steps of the method 600.

Electrical current (e.g., to ground or an electrical reference point ofthe CPBD) is measured in each of the probes during a process 635. In oneembodiment, current may only be measured in a limited number of theplurality of probes within the CPBD chamber, although this sub-set ofprobes includes the probe selected by the user during the process 615.

The probe currents may be measured in a conventional manner. Thoseskilled in the art are familiar with the myriad, commercially availableapparatus which may be employed for such probe current measurement, suchas electrometers and various amplifiers, among others. Nonetheless,other apparatus are also within the scope of the present disclosure.

The method 600 also includes a process 640 by which the probe that isexposed to the CPB by the process 630 is identified. For example, thecurrent measured from the probe exposed to the CPBD may be greater inmagnitude than the current measured from the other probes.

Referring to FIG. 7, illustrated is a block diagram of at least aportion of one embodiment of an apparatus 700 according to aspects ofthe present disclosure. The apparatus 700 is one example of apparatusthat may be employed to perform the method 600 shown in FIG. 6, or mayotherwise may be employed during performance of the method 600.

The apparatus 700 includes or is coupled to or otherwise associated withan SEM or other CPBD 705 having a chamber in which one or more probesmay be utilized according to aspects of the present disclosure. Thecurrent in each probe is communicated via cables 710 to acurrent-to-voltage converter 715. Voltage signals corresponding to eachof the probes may thus be communicated to an analog-to-digital converter(ADC) 720 or another device having such conversion capabilities, whichmay also be configured to communicate video signals with the CPBD 705via cabling 725.

The ADC 720 may be in communication with a computer (e.g., a personalcomputer) 730 and a digital-to-analog converter (DAC) 735. One or bothof the ADC 720 and the DAC 735 may be integral components or functionsof the computer 730, although they may also be discrete componentscoupled to the computer 730. The DAC 735 may also be in communicationwith the CPBD 705, such as through cabling 740. Such communication mayregard the control of one or more aspects of the CPBD 705, such as thedeflection or other aspects of the CPB.

In one embodiment of operation of the apparatus 700, such as in accordwith the method 600 of FIG. 6, an imaging unit the CPBD 705 may beemployed to generate an image of a DUT and one or more probes orientedwithin the chamber of the CPBD 705, such that an image of the DUT andprobes may be displayed on a screen of the computer 730. Thereafter, auser may select one of the probes displayed in such image, such as byusing a mouse to position a pointer on the display screen over the imageof the desired probe and pressing a button on the mouse. The user mayalso reposition the pointer to another site on the DUT displayed in theimage on the screen of the computer 730 and again press a mouse buttonto indicate a target location to which the selected probe is to bepositioned.

Thereafter, the CPBD 705 may automatically switch to a “spot” mode, suchas in response to receiving the user input regarding the targetlocation, or the CPBD 705 may be manually switched to “spot” mode by theuser. The narrowed CPB generated in the CPBD 705 may then be directed tothe previously selected probe, or to the location corresponding to thelocation of the previously selected probe, as indicated by an increasedcurrent measured from the selected probe by the converter 715 and/or theADC 720, among other possible components.

Referring to FIG. 8, illustrated is another embodiment of the apparatus700 shown in FIG. 7, herein designated by the reference numeral 800. Theapparatus 800 may include or be associated with a CPBD 705 that may besubstantially similar to the CPBD 705 shown in FIG. 7. However, thecabling 710 extending from probes located within the chamber of the CPBD705 extend to a selector 850, whereby a reference signal may becommunicated from a signal generator 855 to a selected one of theprobes.

The reference signal may also be communicated from the signal generator855 to a console or other device 860 having display functionality andassociated with the CPBD 705. A video signal from the CPBD 705 may alsobe communicated to the console 860. A comparison of the video signalfrom the CPBD 705 and the reference signal from the generator 855 mayalso be employed to determine which probe is exposed to the CPBgenerated by the CPBD 705 or which probe is being driven by the signalfrom the generator 855. For example, a manual, partially automated orsubstantially automated comparison may reveal a similarity between thevideo signal generated from the CPBD 705 and the reference signal beingcommunicated to one of the probes.

In one embodiment, the apparatus 800 may be used to perform the method600 of FIG. 6, wherein the probe-current detection/imaging may bereplaced by the comparison of the reference signal and the video signal.For example, a comparator unit 870 may be employed for such comparison.

Referring to FIG. 9, illustrated is a flow-chart diagram of at least aportion of one embodiment of a method 900 according to aspects of thepresent disclosure. The method 900 may be employed in a partially orsubstantially automated process for probe positioning. Thus, forexample, the method 900 may be implemented in or performed by one ormore of the apparatus 100 of FIG. 1, the apparatus 200 of FIG. 2, theapparatus 700 of FIG. 7 and the apparatus 800 of FIG. 8. Consequently,the method 900 may be performed in conjunction with the apparatus 400shown in FIG. 4 and/or the apparatus 500 of FIG. 5. The method 900 mayalso be implemented in accord with the APS, CR and/or RS describedabove.

The method 900 may also be used or performed in conjunction withembodiments of the methods 300 a or 300 b shown in FIGS. 3A and 3Band/or the method 600 shown in FIG. 6, whether in a substantiallyparallel, serial or interlaced manner. For example, as in theillustrated embodiment, the method 900 may substantially include themethod 600 of FIG. 6. Consequently, the method 900 may include one ormore processes for determining and/or receiving current and targetlocations for a selected probe (possibly referred to herein as Location1 and Location 2, respectively), as well as a user-desired relocationpath connecting the current and target locations.

The method 900 may be performed to achieve probe positioning that isguided by probe-current imaging. When a semi-automated process is used,such as a point-and-click process, the probing process may at leasttemporarily depart from any then-functioning automation scheme. However,once probes have been properly located above contact points, forexample, such automation may resume, such as where a positioner controldevice may communicate signals to CR, which may loop the probing backinto the automated scheme.

The method 900 may also include a process 905 by which a scan or probetrajectory may be generated. The scan may be substantially similar oridentical to a relocation path that may be received as user input, suchas during the process 625 of the method 600. In other embodiments, thescan generated by the process 905 may merely approximate such user-inputrelocation path, possibly falling within the substantial vicinity of theuser's relocation path. However, in one embodiment, the scan generatedduring the process 905 may have little similarity to the user'srelocation path, other then its endpoints (e.g., initial and targetlocations, or Location 1 and Location 2 referred to above with regard toFIG. 6).

During a process 910 of the method 900, the selected probe may betranslated towards the target location, whether along the relocationpath or otherwise. Such translation may be substantially limited tolateral movements, such as those being substantially parallel to thesurface of the DUT or sample, or may also include a directionalcomponent that is substantially perpendicular to the surface of the DUT.The translation of the probe during the process 910 may also not belimited to translation, but may also include rotational movement aboutone or more axes of rotation. Thus, translation of one or more probeswithin the scope of the present disclosure may, at times, refer to bothtranslation and rotation, which may collectively be referred to aspositioning, repositioning, orientation and/or reorientation.

The current in the translated probe, including current induced by theCPB generated by the CPBD, may be measured in a process 915 of themethod 900. The current measurement of the process 915 may be a singlemeasurement, or multiple periodic or randomly intermittent measurements,or even substantially continuous measurement. The process 915 may alsoinclude measuring current in probes other than or in addition to theprobe being repositioned. Such current measurement may be performed byone or more functions or components of the apparatus 700 of FIG. 7and/or the apparatus 800 of FIG. 8. In one embodiment, such aspects maybe employed in or for collision avoidance processes and protocols, suchas to prevent collisions between probes and other objects within thechamber of the CPBD.

The method 900 may also include a process 920 during which positioningerror may be determined for the probe being repositioned. For example,the probe-locating processes described herein may be employed todetermine any difference between a desired location and the actuallocation of the probe. The process 920 may also include generatingcorrectional drive signals which may be employed to correct any detectedpositioning error. The error and/or correction processes of the process920 may be performed once, repeatedly at periodic or random intervals,or substantially continuously.

The method 900 may also include a process 925 by which exposure of theCPB generated by the CPBD may be limited to the target location. Theprocess 925 may be substantially similar to the process 630 shown inFIG. 6.

A process 930 of the method 900 may include measuring current from aplurality of the probes in the CPBD, including the probe beingrepositioned, and identifying any probe having a greater current inducedby the CPB. The process 930 may be substantially similar to thecombination of the processes 635 and 640 of FIG. 6.

The information gathered during the process 930, among other processesof the method 900, can be used to determine whether the probe beingrepositioned has arrived at its target location. For example, if theexposure of the CPB is limited to the target location by the process 925described above, then the detection of an increased current induced inthe probe being repositioned to the target location may provide anindication that the probe has successfully been repositioned in itstarget location. A decisional step 935 may be included in the method 900to query whether the selected probe is arrived at its target location.The method 900 may thus proceed to processes for repositioningadditional probes or otherwise end operations directed towardspositioning the selected probe, collectively indicated in FIG. 9 by the“SUBSEQUENT PROCESSING” process 940, if it is determined during thedecisional step 935 that the selected probe has successfully reached itstarget location. Alternatively, if the selected probe requiresadditional positioning, a portion of the method 900 may be repeated forthe selected probe, possibly starting with the process 910, as shown inFIG. 9.

Referring to FIG. 10, illustrated is a flow-chart diagram of at least aportion of one embodiment of a method 950 according to aspects of thepresent disclosure. The method 950 may be employed in a partially orsubstantially automated point-and-click process for probe positioning.Thus, for example, the method 950 may be implemented in or performed byone or more of the apparatus 100 of FIG. 1, the apparatus 200 of FIG. 2,the apparatus 700 of FIG. 7 and the apparatus 800 of FIG. 8.Consequently, the method 950 may be performed in conjunction with theapparatus 400 shown in FIG. 4 and/or the apparatus 500 of FIG. 5. Themethod 950 may also be implemented in accord with the APS, CR and/or RSdescribed above. The method 950 may also be used or performed inconjunction with embodiments of the methods 300 a or 300 b shown inFIGS. 3A and 3B, the method 600 shown in FIG. 6, and/or the method 900of FIG. 9, whether in a substantially parallel, serial or interlacedmanner. Several aspects of the individual processes of the method 950may be substantially similar to corresponding processes of the method900 of FIG. 9, in which case the descriptions of the processes in themethod 900 may also apply to one or more processes in the method 950.

The method 950 may be performed to achieve probe positioning that isguided by probe-current imaging. When a semi-automated point-and-clickprocess is used, the probing process may at least temporarily departfrom any then-functioning automation scheme. However, in one embodiment,the method 950 may allow the probing process to substantially remainwithin any such automation scheme. For example, when the positioningprocedure for a selected probe determines that the probe has reached thedesired location (e.g., with respect to contact points on the DUT orsample being examined), the CR or other function or apparatus may signalthe positioner control device or other device controlling probepositioning, which may initiate procedures for bringing the probe tipsinto physical and electrical contact with the desired contact points.This process may be referred to herein as “touch-down” of the probetips, and may be substantially similar to the process 320 of FIGS. 3Aand 3B.

During touch-down, a positioner control device may translate the probesdown and into physical and electrical contact with contact points on thesample. When more than one probe is being used, the probes may belowered simultaneously, in groups, or one at a time, depending on theprogramming of the positioner control device. In one embodiment, the CRincludes a procedure to cause the positioner control device to keep theprobes in the proper position after successful touchdown and until themeasurement is completed. As a tip makes contact, it may send a signalback to the positioner control device, which may activate a sub-routineof the CR. The activated sub-routine may provide an automated processfor determining the quality of the contact made with the sample.

The method 950 includes a process 953 during which a DUT and associatedprobes are imaged with a CPBD, and any current in the probes isacquired, including any current induced by the CPB generated by theCPBD. Aspects of the process 953 may be substantially similar to thosedescribed above.

In a subsequent process 956 of the method 950, individual locations ofeach of the probes is determined, such as from an image of thebeam-induced currents or of all probe currents. The method 950 may alsoinclude a process 959 during which target locations may be received,such as from user input, possibly in conjunction with correspondingrelocation paths. However, the information may also be retrieved and/orinput from a software interface, such as software that may be employedwith a map of the DUT.

The method 950 may proceed to a process 962 during which scans aregenerated along or in the vicinity of the relocation paths determined inthe process 959, such that one or more probes may be translated alongone or more corresponding relocation paths during a process 965. Currentmay then be measured in each translated probe and subsequently analyzedduring a process 968, including any beam-induced currents. Such currentsmay be employed during a process 971 to determine any positional errorsand/or generate correctional drive signals. One or more of the processes965, 968 and 971 may be repeated until, as possibly determined by adecisional step 974, each of the probes being translated successfullyarrives at its corresponding target location, at which time the method950 ends or proceeds to additional processes.

Referring to FIG. 11, illustrated is a flow-chart diagram of at least aportion of one embodiment of a method 980 according to aspects of thepresent disclosure. The method 980 may be employed in a substantiallymanual, a partially automated or a substantially automatedpoint-and-click process for probe positioning. Thus, for example, themethod 980 may be implemented in or performed by one or more of theapparatus 100 of FIG. 1, the apparatus 200 of FIG. 2, the apparatus 700of FIG. 7 and the apparatus 800 of FIG. 8. Consequently, the method 980may be performed in conjunction with the apparatus 400 shown in FIG. 4and/or the apparatus 500 of FIG. 5. The method 950 may also beimplemented in accord with the APS, CR and/or RS described above. Themethod 950 may also be used or performed in conjunction with embodimentsof the methods 300 a or 300 b shown in FIGS. 3A and 3B, the method 600shown in FIG. 6, the method 900 of FIG. 9, and/or the method 950 of FIG.10, whether in a substantially parallel, serial or interlaced manner.

The method 980 may be employed to determine physical and electricalcontact with contact points on a DUT or sample within the chamber of aCPBD. For example, a process 983 may initially be performed to positionone or more probe over a contact point, where such positioning mayprimarily be in a plane that is substantially parallel to a surface ofthe sample. Thereafter, a process 986 may vertically position theprobes, such as in a direction that is substantially perpendicular tothe sample surface. The method 980 includes a decisional step 989 bywhich the positioning processes 983 and 986 may be repeated if“touch-down” is not determined.

However, if no additional positioning is determined necessary during thedecisional step 989, an additional decisional step 992 of the method 980may assess the adequacy of the electrical contact between the probes andtheir corresponding contact points on the sample. For example, if theelectrical contact between a probe and a contact point is such thatelectrical resistance between the probe and contact point is excessive,the probe may be conditioned, characterized, cleaned or otherwiseprocessed during a process 995, such as according to one or more of theprobe preparation procedures described above. However, if the electricalcontact between a probe and contact point is satisfactory (e.g., goodohmic contact), the intended measurement or detection of acharacteristic of the sample may be performed, as indicated by theprocess 998 of the method 980.

Thus, contacting a probe and a sample contact point may includelaterally positioning of the probe over the sample contact point,vertically positioning the probe until physical contact is made betweenthe probe and the contact point, verifying the physical contact via thetouch-down processing described above, and verifying the electricalquality of the contact between the probe and contact point. Moreover,the method 980 may be substantially manual, partially automated orsubstantially automated according to aspects of the present disclosure.For example, the process 989 may include executing a sub-routine of theCR to determine whether physical contact between the probe and sampleexists. The sub-routine may comprise programming to instruct apositioner control device or the CPBD to implement a procedure thatobtains information indicative of physical contact between the probe tipand the sample. Such procedures may include: (1) detecting capacitance(AC and/or DC); (2) detecting force; (3) enabling visual observations ofthe probe tip and the sample; (4) scanning probe imaging methods; (5)observations of a mechanical pivot (vision); (6) determination ofinteraction with the CPB; and/or (7) using EDX for positioninginformation energy dispersive x-ray analysis.

One embodiment of a capacitance-based procedure for determiningprobe-sample contact involves determining the capacity or change incapacity between the probe and the sample. An embodiment of aforce-detection procedure for determining probe-sample contact mayemploy a force sensor that signals when localized forces meet or exceeda threshold value, which may indicate close proximity or mechanicalcontact of the tip with the contact point of the sample. Force-detectionprocedures can also be implemented with cantilevers or other springscombined with position detectors, whereby a spring constant may be usedto calculate probe deflection as a function of force. Scanning probeimaging methods for determining probe-sample contact may provide data bywhich a signal indicating contact can be generated.

With regard to mechanical pivot observation methods for determiningprobe-sample contact, mechanical contact of the probe can create a pivotpoint. Detection of any pivoting or rotation of the probe around a pivotpoint may be indicated by lateral deflections of the probe which may beanalyzed with simultaneously acquired images of the CPB to revealindications of mechanical contact of the probe. The existence of thepivot point, and optionally the location of the pivot point, may becommunicated by the CPBD as a signal that touch-down has been made. Withregard to EDX-based determination of probe-sample contact, x-raysinduced by the CPB may interact with the sample and subsequently beanalyzed to obtain information regarding the elemental composition ofthe sample, thereby supporting identification of the site to becontacted.

These and other aspects of the method 980 may be implemented as anautomated process within the APS, or as a semi-automated processperformed outside of the APS subsequently reintroduced into the APS uponcommunications confirming that physical contact has been made.Consequently, the CR may initiate an additional sub-routine or set ofprocedures for determining that electrical contact has been made betweenthe probe tip and the contact point. Alternatively, prior to determiningelectrical contact, sub-routines can be implemented by the CR to causecertain procedures to be performed to improve the probability that theprobe tips have not only physically contacted the contact points, buthave also electrically contacted the contact points, and remain in goodelectrical contact with the contact points.

In one embodiment, such as according to certain procedures suitable forimproving the probability of electrical contact, communications are sentbetween the CR and the positioner control device employed to positionthe probes. Suitable procedures may include: (1) scrubbing, whichcomprises moving the probe around, and “digging” into the contact; (2)using a separate “chisel probe,” which comprises employing another tipin to roughen up the contact surface; and (3) using a hammer probe,which comprises employing a probe to “hammer” another probe into thecontact surface. Each such procedure can be implemented as a partiallyor substantially automated process by appropriate programming within theCR and communications between the CR and the positioner control device.

Some processes for improving the probability of adequate electricalcontact between a probe and sample contact point may be implemented inan ex-situ or in-situ probe preparation or sample preparation process.One such method includes dipping or coating the probe and/or sample witha metal that melts at a temperatures low enough to not damage the probeor sample. Consequently, the metal may “wet” the sample contact point,possibly increasing the likelihood of satisfactory ohmic contact becauseone or both of the probe and the sample contact point is allowed tocontact softer metal. In one such embodiment, the metal may be one thatwill alloy with the probe.

One embodiment of a sub-routine (e.g., of the CR) that may be activatedduring the process 992 to determine whether electrical contact betweenthe probe and the contact point on the sample has been made includesprogramming to instruct the corresponding positioner control deviceand/or the CPBD to implement a procedure that obtains informationindicative of any electrical contact between the probe tips and thesample. Such procedures may include, among others: (1) positioning twoprobes on a single contact point; (2) moving probes to share a contactto assure ohmic contact; (3) employing split probe contacts; (4)reversing probes and/or polarity; (5) current sensing; (6) conductance;and (7) changes in secondary electron emission (voltage contrast).

For example, positioning two probes on a single contact point maycomprise dropping two probes onto the same contact point and determiningwhether there is ohmic contact between the two probes. Ohmic contactbetween the two probes can be indicative of the existence of ohmiccontact between either of the two probes and the contact point on thesample.

A perspective view of an example of a split probe 1400 is illustrated inFIG. 14. The exemplary split probe 1400 employs a probe having adielectric layer 1402 separating the probe 1400 into “halves” 1404 and1406. Upon making physical contact between the split probe 1400 and thesample, the detection of ohmic contact between the two “halves” 1404 and1406 can indicate ohmic contact between the split probe 1400 and thesample contact point.

Reversing probes and or the polarity or probes to determine whetherelectrical contact has been made between the probe tips and the contactpoints can involve making physical contact between each of the twoprobes and the sample contact point, then: (1) switching the probes; or(2) switching the polarities of each of the probes. Changes in secondaryelectron emission (voltage contrast) generally involve putting the tipat a certain voltage and determining whether the signal will increase ordecrease when the tip makes contact with the contact point. Thisprocedure requires both physical and electrical contact, and thus, ifemployed, there is no need to execute the sub-routine for determiningphysical contact. Conductance and current sensing are similar procedureseach requiring physical and electrical contact. Thus, if one of these isemployed, there is no need to execute the sub-routine for determiningphysical contact.

Each of the foregoing procedures for determining electrical probe-samplecontact may be implemented as one or more partially or substantiallyautomated processes, such as within the APS. Where implemented as one ormore semi-automated processes, they may be performed outside of the APSand subsequently reintroduced into the APS upon communicationsconfirming that electrical contact has been made. Depending on thesub-routine executed, the positioner control device or the CPBD may beresponsible for sending the communication to the CR that electricalcontact has been made.

Referring to FIGS. 12A-12C, collectively, illustrated are schematicviews of at least a portion of a probe 1210 during various stages of aprobe preparation process according to aspects of the presentdisclosure. The composition of the probe 1210 may be substantiallymetallic. The process depicted in FIGS. 12A-12C may be employed tosharpen the probe 1210, such as to sharpen the tip 1215 of the probe1210. Additionally, or alternatively, the process depicted in FIGS.12A-12C may be employed to clean the probe 1210 and/or probe tip 1215.However, for the sake of simplicity, the process depicted in FIGS.12A-12C may be referred to herein as a probe sharpening process. Theprocess depicted in FIGS. 12A-12C may also be substantially similar tothe ETP described above, and may be employed to process solid probes (asin the embodiments of FIGS. 12A-12C) or split probes, among others.

FIG. 12A depicts an initial or intermediate stage of the sharpeningprocess. An additional probe 1220 is employed in the depicted process,where the probe 1210 to be sharpened may have a smaller diameter thanthe probe 1220, may be thinner than the probe 1220, or may otherwisehave substantially smaller dimensions relative to the probe 1220,including cross-sectional dimensions and length dimensions. Also,although depicted in FIGS. 12A-12C as being substantially cylindrical,one or both of the probes 1210, 1220 may not be substantiallycylindrical or otherwise have a substantially non-circularcross-sectional shape, such as a substantially square or rectangularshape, or an asymmetric shape, among others. In the illustratedembodiment, the probe 1210 initially has a diameter that is about 25%less than the diameter of the probe 1220. Of course, the relativediameters of the probes 1210, 1220 may vary from the illustratedembodiment within the scope of the present disclosure.

As shown in FIG. 12A, the probes 1210, 1220 may be placed in contact toclose an electrical loop with a voltage, current or thermal energysource 1230. In other embodiments, however, the probes 1210, 1220 maymerely be in close relative proximity but may not be in physical contactwith one another.

FIG. 12B depicts a subsequent stage of the sharpening process relativeto the stage depicted in FIG. 12A, and in which the tips 1215, 1225 ofthe probes 1210, 1220, respectively, have been heated to and maintainedat an elevated temperature for a sufficient period of time that aportion of the metal forming the probe tip 1215 has dislodged, possiblyre-depositing on the probe tip 1225. Thus, for example, the probe tip1215 has narrowed, while the probe tip 1225 has increased in size.

FIG. 12C depicts a subsequent stage of the sharpening process relativeto the stage depicted in FIG. 12B, and in which the tips 1215, 1225 havebeen maintained at an elevated temperature for a sufficient period oftime that an additional amount of metal has dislodged from the probe tip1215 and possibly re-deposited on the probe tip 1225. Consequently, theprobe tip 1215 may be substantially sharpened relative to its statusdepicted in FIGS. 12A and 12B. The probe tip 1225 may have alsoincreased in size relative to its size depicted in FIGS. 12A and 12B.

Although not limited within the scope of the present disclosure, theelevated temperature at which the probe tips 1215, 1225 are maintainedduring the probe tip sharpening process described above may rangebetween about 600° C. and about 4000° C. In one embodiment, an elevatedprobe tip temperature within this range and others may result fromresistive heating, such as that which may result from applying acrossthe probe tips 1215, 1225 a voltage ranging between about 1 volt andabout 500 volts and/or a current ranging between about 100 nanoamps andabout 10 microamps. However, the scope of the present disclosure is notlimited to such an embodiment.

The elevated temperature at which the probe tips 1215, 1225 aremaintained may also vary between the probe tips 1215, 1225. For example,the elevated temperature at which the probe tip 1215 is maintained maybe more or less than the elevated temperature at which the probe tip1225 is maintained. Additionally, the period of time during which eitheror both of the probe tips 1215, 1225 may be maintained may range betweenabout 1 second and about 30 seconds. However, this period of time may besubstantially less than 1 second, including embodiments effecting asubstantially instantaneous metal transfer.

Referring to FIGS. 13A-13C, collectively, illustrated arerepresentations of images 1301-1303 that may each be created with a CPBDaccording to aspects of the present disclosure, such as those imageswhich may be created when employing an SEM according to one or morepartially or substantially automated processes described above. Theimages 1301-1303 each depict a plurality of probes 1310 that are eachpositioned over or contacting a corresponding contact point or otherfeature 1320 of a sample 1330 being investigated within the CPBD.

When investigating a sample in a CPBD, such as employing one or moreprobes to perform electrical measurement or detection of acharacteristic of a sample or sample feature, video rate images of theprobes and/or sample can reveal useful information regarding theelectrical signal(s) entering and exiting the probes and/or sample. Insome situations, an image may shift vertically relative to the CPBDimage display device, as depicted in FIG. 13A. In other situations, animage may shift horizontally relative to the CPBD image display device,as depicted in FIG. 13B. In still further situations, an image mayoscillate and/or become blurry, as depicted in FIG. 13C. Moreover, thesesituations may overlap. For example, an image may shift vertically andhorizontally, resulting in a diagonal shift having both vertical andhorizontal components relative to the CPBD image display device, and anoscillating or blurred image may also shift vertically, horizontally ordiagonally relative to the CPBD image display device.

A vertical image shift may at least partially result from electricalbias inherent to the sample investigation, such as when a sample isbeing investigated in a “power-on” or operational mode relative to whenthe same sample is being investigated in a substantially identicalmanner but where the sample is passive, “powered-off” or otherwiseunbiased (with the possible exception of any bias resulting fromincidence of the CPB of the CPBD). One such example is shown in FIG.13A, which depicts vertically shifted probes 1310′ and contact points1320′ relative to the initially displayed probes 1310 and contact points1320.

A horizontal image shift may at least partially result from electricalcurrent inherent to the sample investigation, such as when an electricalcurrent is introduced onto a sample or one or more probes, in contrastto when the sample and probes are electrically static (with the possibleexception of any bias resulting from incidence of the CPB of the CPBD).One such scenario may be during the above-described probe-currentimaging, where the current introduced into the probes may cause thehorizontal CPBD image shift in a similar manner to current passedthrough a semiconductor device, silicon chip or other device beingtested. An example of such scenario is shown in FIG. 13B, which depictshorizontally shifted probes 1310″ and contact points 1320″ relative tothe initially displayed probes 1310 and contact points 1320.

An oscillation or blurring may at least partially result from electricalnoise resident in the CPBD chamber or control lines, the sample, theprobes, and/or other locations. One such example is shown in FIG. 13C,which depicts horizontally shifted probes 1310′″ relative to theinitially displayed probes 1310.

Images may also exhibit large jumps, possibly about equal to the widthof the display screen, when switching electrical measurement scales, orwhen bias or current abruptly starts or stops. Combinations of motionmay also be exhibited. For example, an image may move diagonally acrossthe display screen. Such motion can indicate changing bias/current.

Manual, partially automated and/or substantially automated detectionand/or measurement (e.g., shift quantification or shift-distance) ofsuch image shifting and/or motion may be employed alone or incombination with aspects of other methods and procedures describedherein. For example, partially or substantially automated vision ordetection of an image or image shift at video rates may be employed togauge the quality of contact between a probe and a sample contact point.Such image shift and/or motion may also be employed to detect and/ormeasure electrical response, such as the response of a device or circuitin a sample being investigated in a CPBD. Of course, many othercharacteristics described above or otherwise within the scope of thepresent disclosure may also be measured and/or detected by processesemploying or complimented by processes for detecting and/or measuringimage shift and/or motion according to aspects of the presentdisclosure. In one embodiment, image shift and/or motion data may becollected and logged, possibly analyzed to determine relationshipsbetween image behavior, sample characteristics and/or characteristicmeasurement parameters. For example, the distance that an image mayshift in response to current flowing through a probe may be correlatedto the magnitude of the current. Consequently, this correlation may beemployed to confirm connectivity, contact between the probe and anotherobject, conductivity of the probe, etc.

Thus, the present disclosure introduces an apparatus including apositioner controller configured to control manipulation of: (1) adevice under test (DUT) within a charged particle beam device (CPBD);and (2) a probe employed to examine a characteristic of the DUT withinthe CPBD. The apparatus may also include a measurer. Control of thepositioner controller and the measurer may be partially or substantiallyautomated. One embodiment of such apparatus also includes a manipulationplatform, which may also be partially or substantially automated. Themanipulation platform may include a base and a stage coupled to the baseand configured to receive a sample to be examined. The manipulationplatform may also include a plurality of manipulator module interfaceseach coupled to the base and configured to receive a corresponding oneof a plurality of manipulator modules each configured to manipulate atleast one of a probe and the sample received by the stage. Themanipulation platform may also include an interface configured totransfer control and status information between the plurality ofmanipulator module interfaces and at least one of the measurer and thepositioner controller.

Other embodiments may include one more of: (1) a charged particle beamdevice (CPBD) in which a sample to be measured is positioned; (2) apositioner control device communicatively coupled to the CPBD andoperable to individually manipulate each of a plurality of probes intocontact with one of a plurality of contact points on the sample; (3) ameasuring device communicatively coupled to the CPBD and the positionercontrol device and operable to perform one of a measurement and adetection of a characteristic associated with one of the plurality ofcontact points; and (4) a control routine operable to providecommunications to at least one of the CPBD, the positioner controldevice and the measuring device.

The present disclosure also introduces methods which can includeexposing one of several probes to a CPB of a CPBD. Such method may alsoinclude examining a current in at least one of the probes, as thecurrent may indicate which of the probes is exposed to the CPB.

The present disclosure also introduces methods which can includeintroducing a generated signal current to one of a plurality of probespositioned in a CPBD, and exposing each of the probes to a CPB of theCPBD. In an image created by the CPBD, the probe to which the generatedsignal current is introduced is identified based on its uniquerepresentation relative to representations of other probes in the image.

The present disclosure also introduces methods which can include imaginga DUT and a plurality of probes with a CPBD. Individual locations ofeach of the probes is determined based on beam induced probe currentimages. Target locations and/or probe relocation paths eachcorresponding to one of the probes may be retrieved from a softwareinterface input or user input. Scans approximating the relocation pathsmay be generated, and each of the probes may be moved towards its targetlocation based substantially on its relocation path. Beam inducedcurrents corresponding to the probes may then be analyzed, andpositioning errors and correctional drive signals may also bedetermined.

The present disclosure also introduces methods which can includepositioning a probe over a DUT located within a CPBD, translating theprobe toward a contact point on the DUT, and iteratively repeating thepositioning and the translating until touchdown of the probe on thecontact point is determined. The quality of the electrical contactbetween the probe and the contact point is then assessed, and anelectrical measurement is performed with the probe if the assessedquality of the electrical contact falls within a predeterminedacceptance criteria.

The present disclosure also introduces methods which can includeincluding collecting data from a CPBD regarding a characteristic of asample being examined within a chamber of the CPBD, storing thecollected data, processing the stored data, and transferringelectronically the processed data to an apparatus configured toelectronically communicate with the CPBD. At least one of thecollecting, storing, processing and transferring may be substantiallyautomated. The apparatus configured to electronically communicate withthe CPBD may be a master controller, such as those described above. Amaster controller may be or include one or more devices and/or units,whether hardware and/or software, which may be configured to control theoverall sequencing of application logic. For example, a mastercontroller may determine and execute a particular order of operationsfor a given process that is being engaged by a user or machine, or a setof such processes.

The present disclosure also introduces methods which can includepositioning a first probe tip proximate a second probe tip. At least oneof the probe tips is heated such that a portion of probe materialforming that probe tip dislodges to sharpen the probe tip.

The present disclosure also introduces methods which can includeexamining a shift and/or motion of an image relative to a CPBD device onwhich the image is displayed. The status and/or change in status of anelectrical characteristic of at least one of an environment of a CPBDchamber, a sample located with the CPBD chamber, and a probe locatedwithin the CPBD chamber may then be determined based on the image shiftand/or motion.

Although embodiments of the present disclosure have been described indetail, those skilled in the art should understand that they can makevarious changes, substitutions and alterations herein without departingfrom the spirit and scope of the present disclosure.

1. An apparatus, comprising: a positioner controller configured tocontrol positioning of at least one of a device under test (DUT) and aprobe within a chamber of a charged particle beam device (CPBD),including positioning control by at least partial automation of at leastone of: orientation of the DUT within the CPBD chamber for examinationof the DUT within the CBPD chamber; and orientation of the probe withinthe CPBD chamber for examination of at least one of the probe and theDUT; and relative orientation of the probe and the DUT for establishingcontact between the probe and the DUT within the CPBD chamber.
 2. Theapparatus of claim 1 further comprising the CPBD.
 3. The apparatus ofclaim 1 wherein the positioning control by at least partial automationis positioning control by substantial automation.
 4. The apparatus ofclaim 1 wherein the positioning control by at least partial automationincludes positioning control of the orientation of the DUT within theCPBD chamber, positioning control of the orientation of the probe withinthe CPBD chamber, and positioning control of the relative orientation ofthe probe and the DUT.
 5. The apparatus of claim 1 further comprising ameasurer configured to receive, via substantial automation, informationfrom the probe indicative of a characteristic of at least a portion ofthe DUT.
 6. The apparatus of claim 1 further comprising: a manipulationplatform configured to be anchored within the CPBD chamber andincluding: a base; and a stage coupled to the base and configured toreceive the DUT; a plurality of manipulator modules each coupled to thebase and configured to manipulate at least one of the probe and the DUT;and an interface configured to transfer information between thepositioner controller and ones of the plurality of manipulator modules;wherein the positioning control by at least partial automation includespositioning control of at least one of the plurality of manipulatormodules.
 7. The apparatus of claim 6 wherein each of the plurality ofmanipulator modules includes a probe positioner having a detachableend-effector configured to contact the DUT.
 8. The apparatus of claim 1wherein the probe includes: a first conductive portion; a secondconductive portion; and a dielectric layer electrically isolating thefirst and second conductive portions; wherein the first and secondconductive portions are configured to be electrically connected bycontacting the probe to a conductive feature of the DUT within the CPBDchamber.
 9. The apparatus of claim 1 further comprising storagestructure configured to: store at least one end-effector within the CPBDchamber, wherein the probe is an examination probe and the end-effectorincludes the examination probe and an assembly probe extending inopposing directions, wherein the assembly probe is configured to couplewith a positioner; and release the at least one end-effector uponconnection between the assembly probe and a corresponding assemblysocket of the positioner.
 10. The apparatus of claim 9 wherein theend-effector includes a plurality of the examination probes and acorresponding plurality of the assembly probes.
 11. A method,comprising: transferring a probe to a chamber of a charged particle beamdevice (CPBD); establishing contact between the probe and a contactpoint of a device under test (DUT) positioned within the CPBD chamber;and measuring a characteristic of the DUT while the probe is contactingthe DUT contact point; wherein at least one of the transferring, theestablishing and the measuring is via substantial automation.
 12. Themethod of claim 11 wherein each of the transferring, the establishingand the measuring is via substantial automation.
 13. The method of claim11 further comprising mechanically coupling the probe and a probepositioner via substantial automation prior to transferring the probe tothe CPBD chamber.
 14. The method of claim 11 further comprising at leastone of: positioning the DUT within the CPBD chamber via substantialautomation prior to establishing contact between the probe and the CPBD;de-processing the DUT via substantial automation prior to establishingcontact between the probe and the DUT contact point; preparing the DUTvia substantial automation prior to establishing contact between theprobe and the DUT contact point; assessing via substantial automation anelectrical quality of contact between the probe and the DUT contactpoint after establishing the contact; conditioning the probe viasubstantial automation if the assessed electrical quality does not fallwithin predetermined acceptance criteria; and retracting the DUT fromthe CPBD chamber via substantial automation after measuring the DUTcharacteristic.
 15. The method of claim 11 further comprising at leastone of preparing, conditioning and characterizing the probe viasubstantial automation within the CPBD chamber.
 16. The method of claim11 further comprising storing the probe within the CPBD chamber viasubstantial automation.
 17. The method of claim 11 further comprisingexchanging the probe with an additional probe positioned within the CPBDchamber, wherein the exchanging is via substantial automation.
 18. Themethod of claim 11 wherein the probe is one of first and second probespositioned in the CPBD chamber, and wherein measuring the DUTcharacteristic includes: exposing one of the first and second probes toa charged particle beam (CPB) of the CPBD; and examining a current in atleast one of the first and second probes, wherein the current isindicative of which of the first and second probes is exposed to theCPB.
 19. The method of claim 11 wherein the probe is one of first andsecond probes positioned in the CPBD chamber, and wherein measuring theDUT characteristic includes: introducing a generated signal current toone of the first and second probes; exposing each of the first andsecond probes to a charged particle beam (CPB) of the CPBD; andidentifying, in an image created by the CPBD, the one of the first andsecond probes to which the generated signal current is introduced basedon a unique representation of the one of the first and second probesrelative to the other of the first and second probes in the image. 20.The method of claim 11 further comprising, after measuring thecharacteristic: collecting data regarding the characteristic; storingthe collected data; processing the stored data; and transferringelectronically the processed data to an apparatus configured toelectronically communicate with the CPBD; wherein at least one of thecollecting, storing, processing and transferring is via substantialautomation.
 21. The method of claim 11 further comprising, prior toestablishing contact between the probe and the DUT contact point:contacting a first probe tip of the probe with a second probe tip ofanother probe within the CPBD chamber; and heating the first probe tipsuch that a portion of material forming the first probe tip dislodges tosharpen the first probe tip.
 22. The method of claim 11 whereinmeasuring the characteristic includes: examining at least one of a shiftand motion of an image of at least one of the probe and the DUT; anddetermining at least one of a status and a change in status of anelectrical characteristic of at least one of an environment of the CPBDchamber, the DUT located with the CPBD chamber, and the probe locatedwithin the CPBD chamber, wherein the determining is based on the atleast one of the image shift and motion.
 23. An apparatus, comprising: apositioner control device communicatively coupled to a chamber of acharged particle beam device (CPBD) and configured to individuallymanipulate each of a plurality of probes within the CPBD chamber toestablish contact between ones of the plurality of probes andcorresponding ones of a plurality of contact points of a samplepositioned in the CPBD chamber; a measuring device communicativelycoupled to the CPBD and the positioner control device and configured toperform one of a measurement and a detection of a characteristicassociated with one of the plurality of contact points; and a controlroutine configured to at least partially automate control of at leastone of the CPBD, the positioner control device and the measuring device.24. The apparatus of claim 23 further comprising a reference system (RS)configured to spatially relate ones of the plurality of probes to atleast one of the CPBD and the positioner control device by at leastpartial automation.
 25. The apparatus of claim 23 wherein the controlroutine is configured to at least partially automate control of aplurality of processes including: selection of one of the plurality ofprobes for use in the measurement or detection of the characteristic;ex-situ preparation of at least one of the plurality of probes; ex-situconditioning of at least one of the plurality of probes; ex-situcharacterization of at least one of the plurality of probes; in-situpreparation of at least one of the plurality of probes; in-situconditioning of at least one of the plurality of probes; in-situcharacterization of at least one of the plurality of probes; ex-situpreparation of the sample; ex-situ conditioning of the sample; ex-situcharacterization of the sample; in-situ preparation of the sample;in-situ conditioning of the sample; in-situ characterization of thesample; identification of at least one of the plurality of probes in animage created from data generated by the CPBD; translation of at leastone of the plurality of probes relative to the sample; establishment ofcontact between at least one of the plurality of probes and at least oneof the plurality of contact points; measurement of the characteristic;detection of the characteristic; and replacement of at least one of theplurality of probes.